Implication of subband broadening in the quantum well of a-Si:H/a-Ge:H multilayers

被引:4
|
作者
Ohmura, M [1 ]
Deki, H [1 ]
Yamashita, K [1 ]
Miyazaki, S [1 ]
Hirose, M [1 ]
机构
[1] HIROSHIMA UNIV, DEPT ELECT ENGN, HIGASHIHIROSHIMA 739, JAPAN
关键词
D O I
10.1016/0022-3093(96)00045-2
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The optical absorption, photoluminescence and conductivity of well-defined a-Si:H/a-Ge:H multilayers have been investigated as a function of the a-Si:H barrier width. The optical absorption edge and luminescence peak energy exhibit a similar red-shift with decreasing the a-Si:H barrier width. Also, the decrease of the barrier width causes a reduction in the conductivity activation energy and the corresponding increase in the dark conductivity. These properties are explained partly by the subband broadening in the a-Ge:H quantum well because of the enhanced carrier tunneling probability through the ultrathin a-Si:H barriers and partly by a decrease of hydrogen content in the a-Ge:H well layer.
引用
收藏
页码:817 / 820
页数:4
相关论文
共 50 条
  • [21] Thermalization gap of a-Si:H well layer in a-Si:H/a-Si3N4:H multilayers
    Murayama, K
    Katagiri, N
    Ouno, K
    Nakata, H
    Miyazaki, S
    Hirose, M
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 : 1072 - 1076
  • [22] Femtosecond studies of photoinduced bleaching and hot carrier dynamics in a-Si:H and a-Ge:H
    Wraback, M.
    Tauc, J.
    Pang, D.
    Paul, W.
    Lee, J.-K.
    Schiff, E.A.
    Journal of Non-Crystalline Solids, 1991, 137-38 (pt 1) : 531 - 534
  • [23] Some aspects on an improved stability of a-Si:H and a-Ge:H films with respect to their microstructure
    Bauer, S
    Haage, T
    Schroder, B
    Oechsner, H
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 200 : 462 - 465
  • [24] PHOTOELECTRONIC PROPERTIES OF A-SI=H AND A-GE=H THIN-FILMS IN SURFACE CELL STRUCTURES
    PARSONS, GN
    KUSANO, C
    LUCOVSKY, G
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 1655 - 1660
  • [25] Optical modelling of a-Si:H and a-Ge:H P-I-N solar cells
    Saeng-udom, R.
    Bullemer, B.
    Kusian, W.
    Proceedings of the International Conference on Photovoltaic Solar Energy, 1991,
  • [26] STRUCTURE AND PROPERTIES OF A-SI AND A-GE
    WEAIRE, D
    ALBEN, R
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1973, 18 (03): : 306 - 306
  • [27] HOPPING TRANSPORT IN A-GE AND A-SI
    ORTUNO, M
    POLLAK, M
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1983, 47 (06): : L93 - L98
  • [28] Thermalization gaps of the ultra-thin a-Si:H well layers in a-Si:H/a-Si3N4:H multilayers
    Murayama, K
    Katagiri, N
    Miyazaki, S
    Hirose, M
    SOLID STATE COMMUNICATIONS, 1999, 111 (12) : 693 - 697
  • [29] Composition and electronic properties of a-SiGe:H alloys produced from ultrathin layers of a-Si:H/a-Ge:H
    Abo Ghazala, MS
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2000, 11 (05) : 429 - 432
  • [30] Interface vibrational spectrum investigation on reactively-sputtered a-Si:H/a-Ge:H multilayer films
    Wang, YY
    Xu, HZ
    THIN SOLID FILMS, 1997, 299 (1-2) : 10 - 13