Recent Advances in GaN Power Switching Devices

被引:0
|
作者
Tamura, Satoshi [1 ]
Anda, Yoshiharu [1 ]
Ishida, Masahiro [1 ]
Uemoto, Yasuhiro [2 ]
Ueda, Tetsuzo [1 ]
Tanaka, Tsuyoshi [1 ]
Ueda, Daisuke [3 ]
机构
[1] Panasonic Corp, Semicond Co, Semicond Device Res Ctr, 1 Kotari Yakemachi, Nagaokakyo, Kyoto 6178520, Japan
[2] Panasonic Corp, Semicond Co, Discrete Device Dev Ctr, Kyoto 6178520, Japan
[3] Panasonic Corp, Adv Technol Res Labs, Kyoto 6190237, Japan
关键词
GaN; power switching transistor; Gate Injection Transistor; Inverter IC;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recent advances in GaN power switching devices are reviewed. A new normall-off GaN transistor called Gate Injection Transistor (GIT) increases drain current by conductivity modulation. The GIT is fabricated on cost-effective Si substrates by novel MOCVD technology enabling crack-free and smooth surfaces over 6-inch wafer. These technologies with thermally stable device isolation by Fe ion implantation are applied for a monolithic inverter IC. This is the world fist demonstration of a GaN inverter IC for motor drive, which reduces the total operating loss by 42% from that by the IGBT-based inverter. These technologies are indispensable for wide-spread use of GaN power switching transistors in the future.
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页数:4
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