High Field-Emission Stability of Offset-Thin-Film Transistor-Controlled Al-Doped Zinc Oxide Nanowires

被引:8
|
作者
Yang, Po-Yu [1 ,2 ]
Wang, Jyh-Liang [3 ]
Tsai, Wei-Chih [4 ]
Wang, Shui-Jinn [5 ]
Lin, Jia-Chuan [6 ]
Lee, I-Che [1 ,2 ]
Chang, Chia-Tsung [1 ,2 ]
Cheng, Huang-Chung [1 ,2 ]
机构
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 30010, Taiwan
[2] Natl Chiao Tung Univ, Inst Elect, Hsinchu 30010, Taiwan
[3] Ming Chi Univ Technol, Dept Elect Engn, Taipei 24301, Taiwan
[4] Natl Formosa Univ, Dept Elect Engn, Yunlin 63201, Taiwan
[5] Natl Cheng Kung Univ, Inst Microelect, Dept Elect Engn, Tainan 70101, Taiwan
[6] St Johns Univ, Dept Elect Engn, Taipei 25135, Taiwan
关键词
CHEMICAL-VAPOR-DEPOSITION; ALIGNED CARBON NANOTUBES; LOW-TEMPERATURE; ELECTRON-EMISSION; GROWTH; NANORODS; SILICON; ZNO;
D O I
10.1143/JJAP.50.04DN07
中图分类号
O59 [应用物理学];
学科分类号
摘要
Aluminum-doped zinc oxide (AZO) nanowire (NW) arrays incorporating an offset thin-film transistor (offset-TFT) have been proposed to achieve high field-emission (FE) stability. The AZO NW field emission arrays (FEAs) were hydrothermally grown at a low temperature of 85 degrees C. The uncontrolled AZO NW FEAs demonstrated superior FE characteristics (i.e., turn-on field of similar to 2.17 V/mu m and threshold field of similar to 3.43 V/mu m) compared with those of the conventional CNT FEAs grown at a temperature below 600 degrees C. However, uncontrolled AZO NW FEAs show a larger current fluctuation of 15.6%. Therefore, the offset-TFTs were used to control the AZO NW FEAs. Consequently, the fluctuation of AZO NW FEAs could be significantly reduced to less than 2%. This novel field emission device exhibits good emission stability, low-voltage controllability, low-temperature processing, and structural simplicity, making it promising for applications in flat panel displays. (C) 2011 The Japan Society of Applied Physics
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页数:5
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共 46 条
  • [41] Improved conversion efficiency of a-Si:H/μc-Si:H thin-film solar cells by using annealed Al-doped zinc oxide as front electrode material
    Neubert, Sebastian
    Wimmer, Mark
    Ruske, Florian
    Calnan, Sonya
    Gabriel, Onno
    Stannowski, Bernd
    Schlatmann, Rutger
    Rech, Bernd
    [J]. PROGRESS IN PHOTOVOLTAICS, 2014, 22 (12): : 1285 - 1291
  • [42] Formation of F-Doped Offset Region for Spray Pyrolyzed Self-Aligned Coplanar Amorphous Zinc-Tin-Oxide Thin-Film Transistor by NF3 Plasma Treatment
    Kim, Youn Goo
    Bukke, Ravindra Naik
    Lee, Jiseob
    Saha, Jewel Kumer
    Jang, Jin
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2021, 68 (03) : 1057 - 1062
  • [43] Highly improved photo-induced bias stability of sandwiched triple layer structure in sol-gel processed fluorine-doped indium zinc oxide thin film transistor
    Kim, Dongha
    Park, Hyungjin
    Bae, Byeong-Soo
    [J]. AIP ADVANCES, 2016, 6 (03):
  • [44] Room temperature deposition of high figure of merit Al-doped zinc oxide by pulsed-direct current magnetron sputtering: Influence of energetic negative ion bombardment on film's optoelectronic properties
    Fumagalli, F.
    Marti-Rujas, J.
    Di Fonzo, F.
    [J]. THIN SOLID FILMS, 2014, 569 : 44 - 51
  • [45] High-Mobility Inkjet-Printed Indium-Gallium-Zinc-Oxide Thin-Film Transistors Using Sr-Doped Al2O3 Gate Dielectric
    Choi, Seungbeom
    Kim, Kyung-Tae
    Park, Sung Kyu
    Kim, Yong-Hoon
    [J]. MATERIALS, 2019, 12 (06)
  • [46] Improvement in Long-Term and High-Temperature Retention Stability of Ferroelectric Field-Effect Memory Transistors With Metal-Ferroelectric-Metal-Insulator-Semiconductor Gate-Stacks Using Al-Doped HfO2 Thin Films
    Yoon, So-Jung
    Min, Dae-Hong
    Moon, Seung-Eon
    Park, Kun Sik
    Won, Jong Il
    Yoon, Sung-Min
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, 67 (02) : 499 - 504