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Properties of Metal-Graphene Contacts
被引:42
|作者:
Knoch, Joachim
[1
]
Chen, Zhihong
[2
,3
]
Appenzeller, Joerg
[2
,3
]
机构:
[1] Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany
[2] Purdue Univ, Dept Elect & Comp Engn, W Lafayette, IN 47907 USA
[3] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
关键词:
Contacts;
graphene;
graphene field-effect transistor (GFET);
metal-graphene coupling;
TRANSISTORS;
D O I:
10.1109/TNANO.2011.2178611
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
We present a study on the metal-graphene contact properties. Utilizing a dual-gate field-effect transistor device, an energetic separation between the Fermi level and the Dirac point in the contact areas can be adjusted deliberately by applying an appropriate front-gate voltage that acts only on the channel. This front-gate voltage is compensated by an opposite large-area back-gate voltage, thereby mimicking the metal induced doping effect. A back-gate voltage sweep enables identifying two distinct resistance peaks-a result of the combined impact of the graphene cones in the contact and in the channel region. Comparing our experimental data with simulations allows extracting the coupling strength between metal and graphene and also estimating the magnitude of the metal-induced doping concentration in the case of palladium contacts. In contrast to conventional metal-semiconductor contacts, our simulations predict a decreased on-current for increased coupling strength in graphene field-effect transistors.
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页码:513 / 519
页数:7
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