Fabrication and anisotropy investigations of patterned epitaxial magnetic films using a lift-off process

被引:6
|
作者
Heyderman, LJ [1 ]
Kläui, M
Rothman, J
Vaz, CAF
Bland, JAC
机构
[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[2] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England
关键词
D O I
10.1063/1.1540047
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate a technique to fabricate patterned epitaxial magnetic films using a lift-off process and investigate the magnetic properties using the magneto-optical Kerr effect (MOKE). 150 mum epitaxial face-centred-cubic squares are patterned and a method to extract the anisotropy constant from the hard axis switching field is presented. The maximum switching field on the hard axis can be read easily from the transverse magnetization loop and a second-order magneto-optical effect present in these thin-film systems is used to extract transverse and longitudinal magnetization hysteresis loops from single-longitudinal MOKE measurements. The anisotropy values obtained for the lift-off elements are consistent with those of nonpatterned continuous films of the same material so indicating that the lift-off process presented here has no adverse effects on the epitaxial growth. (C) 2003 American Institute of Physics.
引用
收藏
页码:7349 / 7351
页数:3
相关论文
共 50 条
  • [31] Thin Film GaN LEDs Using a Patterned Oxide Sacrificial Layer by Chemical Lift-Off Process
    Chuang, Shih-Hao
    Pan, Chun-Ting
    Shen, Kun-Ching
    Ou, Sin-Liang
    Wuu, Dong-Sing
    Horng, Ray-Hua
    IEEE PHOTONICS TECHNOLOGY LETTERS, 2013, 25 (24) : 2435 - 2438
  • [32] Epitaxial lift-off process for gallium arsenide substrate reuse and flexible electronics
    Cheng-Wei Cheng
    Kuen-Ting Shiu
    Ning Li
    Shu-Jen Han
    Leathen Shi
    Devendra K. Sadana
    Nature Communications, 4
  • [33] Fabrication of flexible device based on PAN-PZT thin films by laser lift-off process
    Do, Young Ho
    Kang, Min Gyu
    Kim, Jin Sang
    Kang, Chong Yun
    Yoon, Seok Jin
    SENSORS AND ACTUATORS A-PHYSICAL, 2012, 184 : 124 - 127
  • [34] Fabrication of Bacteria Environment Cubes with Dry Lift-Off Fabrication Process for Enhanced Nitrification
    Samarasinghe, S. A. P. L.
    Shao, Yiru
    Huang, Po-Jung
    Pishko, Michael
    Chu, Kung-Hui
    Kameoka, Jun
    PLOS ONE, 2016, 11 (11):
  • [35] Fabrication of Ultra-Thin Diamond Films Using Hydrogen Implantation and Lift-off Technique
    Popov, V. P.
    Antonov, V. A.
    Safronov, L. N.
    Kupriyanov, I. N.
    Pal'yanov, Yu. N.
    Rubanov, S.
    ION IMPLANTATION TECHNOLOGY 2012, 2012, 1496 : 261 - 264
  • [36] Wafer-scale layer transfer of GaAs and Ge onto Si wafers using patterned epitaxial lift-off
    Mieda, Eiko
    Maeda, Tatsuro
    Miyata, Noriyuki
    Yasuda, Tetsuji
    Kurashima, Yuichi
    Maeda, Atsuhiko
    Takagi, Hideki
    Aoki, Takeshi
    Yamamoto, Taketsugu
    Ichikawa, Osamu
    Osada, Takenori
    Hata, Masahiko
    Ogawa, Arito
    Kikuchi, Toshiyuki
    Kunii, Yasuo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (03)
  • [37] Chemical Lift-Off Process Using Acetone Ink for Easy Fabrication of Metallic Nano/Microstructures
    Potejanasak, Potejana
    Truong Duc Phuc
    Terano, Motoki
    Yamamoto, Takatoki
    Yoshino, Masahiko
    INTERNATIONAL JOURNAL OF AUTOMATION TECHNOLOGY, 2020, 14 (02) : 229 - 237
  • [38] Fabrication of InGaAs-on-Insulator Substrates Using Direct Wafer-Bonding and Epitaxial Lift-Off Techniques
    Kim, Seong Kwang
    Shim, Jae-Phil
    Geum, Dae-Myeong
    Kim, Chang Zoo
    Kim, Han-Sung
    Song, Jin Dong
    Choi, Sung-Jin
    Kim, Dae Hwan
    Choi, Won Jun
    Kim, Hyung-Jun
    Kim, Dong Myong
    Kim, Sanghyeon
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2017, 64 (09) : 3594 - 3601
  • [39] HF species and dissolved oxygen on the epitaxial lift-off process of GaAs using AlAsP release layers
    van Niftrik, A. T. J.
    Schermer, J. J.
    Bauhuis, G. J.
    Mulder, P.
    Larsen, P. K.
    van Setten, M. J.
    Attema, J. J.
    Tan, N. C. G.
    Kelly, J. J.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (01) : D35 - D39
  • [40] Lift-off process for nanoimprint lithography
    Carlberg, P
    Graczyk, M
    Sarwe, EL
    Maximov, I
    Beck, M
    Montelius, L
    MICROELECTRONIC ENGINEERING, 2003, 67-8 : 203 - 207