Modeling of the body current in a Bi-MOS hybrid-mode environment

被引:1
|
作者
Yeo, KS [1 ]
Seah, SHL [1 ]
Ma, JG [1 ]
Do, MA [1 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Div Circuits & Syst, Singapore 639798, Singapore
关键词
device modeling; impact ionization; deep submicron LDD MOSFETs;
D O I
10.1016/S0038-1101(00)00206-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The body current Is of deep submicron lightly doped drain pMOSFETs has been investigated. Based on the experimental results, an analytical I-B model, applicable for devices operating in a Bi-MOS hybrid-mode environment, has been developed for the first time. The proposed model is able to effectively characterize the measured is results over a wide range of independently applied biases (gate, drain and body) and gate lengths (from 1 mum down to 0.25 mum). The possibility of minimizing or even eliminating the undesired Ig is also explored and discussed for the first time. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2199 / 2205
页数:7
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