A generalized electron energy probability function for inductively coupled plasmas under conditions of nonlocal electron kinetics

被引:4
|
作者
Mouchtouris, S. [1 ]
Kokkoris, G. [1 ]
机构
[1] NCSR Demokritos, Inst Nanosci & Nanotechnol, Aghia Paraskevi 15310, Greece
关键词
PRESSURE GAS-DISCHARGES; 2-DIMENSIONAL FLUID MODEL; POSITIVE-COLUMN PLASMA; RF REFERENCE CELL; RADIOFREQUENCY DISCHARGES; PARTICLE SIMULATIONS; BOLTZMANN-EQUATION; OXYGEN DISCHARGE; MOLECULAR GASES; GLOW-DISCHARGES;
D O I
10.1063/1.5002653
中图分类号
O59 [应用物理学];
学科分类号
摘要
A generalized equation for the electron energy probability function (EEPF) of inductively coupled Ar plasmas is proposed under conditions of nonlocal electron kinetics and diffusive cooling. The proposed equation describes the local EEPF in a discharge and the independent variable is the kinetic energy of electrons. The EEPF consists of a bulk and a depleted tail part and incorporates the effect of the plasma potential, V-p, and pressure. Due to diffusive cooling, the break point of the EEPF is eV(p). The pressure alters the shape of the bulk and the slope of the tail part. The parameters of the proposed EEPF are extracted by fitting to measure EEPFs (at one point in the reactor) at different pressures. By coupling the proposed EEPF with a hybrid plasma model, measurements in the gaseous electronics conference reference reactor concerning (a) the electron density and temperature and the plasma potential, either spatially resolved or at different pressure (10-50 mTorr) and power, and (b) the ion current density of the electrode, are well reproduced. The effect of the choice of the EEPF on the results is investigated by a comparison to an EEPF coming from the Boltzmann equation (local electron kinetics approach) and to a Maxwellian EEPF. The accuracy of the results and the fact that the proposed EEPF is predefined renders its use a reliable alternative with a low computational cost compared to stochastic electron kinetic models at low pressure conditions, which can be extended to other gases and/or different electron heating mechanisms. Published by AIP Publishing.
引用
收藏
页数:13
相关论文
共 50 条
  • [22] Optical diagnostics for characterization of electron energy distributions: argon inductively coupled plasmas
    Boffard, John B.
    Jung, R. O.
    Lin, Chun C.
    Aneskavich, L. E.
    Wendt, A. E.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (05):
  • [23] Electron kinetics in capacitively coupled plasmas modulated by electron injection
    Zhang, Ya
    Peng, Yanli
    Innocenti, Maria Elena
    Jiang, Wei
    Wang, Hong-yu
    Lapenta, Giovanni
    JOURNAL OF APPLIED PHYSICS, 2017, 122 (10)
  • [24] Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic regimes
    Lee, Hyo-Chang
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2012, 19 (03)
  • [25] Effect of remote inductively coupled plasma (ICP) on the electron energy probability function of an in-tandem main ICP
    Lee, Jaewon
    Kim, Kyung-Hyun
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2017, 24 (02)
  • [26] Electron energy probability function and L-p similarity in low pressure inductively coupled bounded plasma
    Chatterjee, Sanghamitro
    Bhattacharjee, Sudeep
    Charles, Christine
    Boswell, Rod
    FRONTIERS IN PHYSICS, 2015, 3
  • [27] Electron energy distribution functions in low-pressure inductively coupled bounded plasmas
    Meige, Albert
    Boswell, Rod W.
    PHYSICS OF PLASMAS, 2006, 13 (09)
  • [28] Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas
    Lee, Min-Hyong
    Lee, Hyo-Chang
    Chung, Chin-Wook
    PHYSICAL REVIEW E, 2010, 81 (04):
  • [29] Electron kinetics and non-Joule heating in near-collisionless inductively coupled plasmas
    Kolobov, VI
    Lymberopoulos, DP
    Economou, DJ
    PHYSICAL REVIEW E, 1997, 55 (03): : 3408 - 3422
  • [30] Effect of electron kinetics on plasma density in inductively coupled plasmas using a passive resonant antenna
    Kim, Ju-Ho
    Chung, Chin-Wook
    PHYSICS OF PLASMAS, 2020, 27 (06)