Factors affecting the electroless deposition of Ni-Cu-P coatings

被引:0
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作者
Georgieva, J [1 ]
Armyanov, S [1 ]
机构
[1] Bulgarian Acad Sci, Inst Phys Chem, BU-1113 Sofia, Bulgaria
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中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Because of the numerous usual and new applications of the electroless amorphous Ni-Cu-P alloys aiming an improvement of Ni-P properties, it is worth achieving adequate empirical modeling of the electroless Ni-Cu-P deposition process. It will enable the estimation of the effect of pH and complexing agents on the deposition rate, phosphorus and copper content. For this purpose a statistical technique is selected: a full-effect factorial design (FD) of a planned experiment with three factors at two levels of the process variables. This FD experiment allows observing the effects of each factor at different levels of the other variables, as well as the interactions between these factors. As a result it was established that the deposition rate and copper content in the alloy are affected the most powerfully by pH and citrate concentration, All obtained regression models include interactions between the variables.
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页码:503 / 514
页数:12
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