Factors affecting the electroless deposition of Ni-Cu-P coatings

被引:0
|
作者
Georgieva, J [1 ]
Armyanov, S [1 ]
机构
[1] Bulgarian Acad Sci, Inst Phys Chem, BU-1113 Sofia, Bulgaria
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Because of the numerous usual and new applications of the electroless amorphous Ni-Cu-P alloys aiming an improvement of Ni-P properties, it is worth achieving adequate empirical modeling of the electroless Ni-Cu-P deposition process. It will enable the estimation of the effect of pH and complexing agents on the deposition rate, phosphorus and copper content. For this purpose a statistical technique is selected: a full-effect factorial design (FD) of a planned experiment with three factors at two levels of the process variables. This FD experiment allows observing the effects of each factor at different levels of the other variables, as well as the interactions between these factors. As a result it was established that the deposition rate and copper content in the alloy are affected the most powerfully by pH and citrate concentration, All obtained regression models include interactions between the variables.
引用
收藏
页码:503 / 514
页数:12
相关论文
共 50 条
  • [1] Factors affecting the electroless deposition of Ni-Cu-P coatings
    Georgieva, J
    Armyanov, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (11) : C760 - C764
  • [2] ELECTROLESS DEPOSITION OF NI-CU-P ALLOYS
    CHERKAOUI, M
    SRHIRI, A
    CHASSAING, E
    PLATING AND SURFACE FINISHING, 1992, 79 (11): : 68 - 71
  • [3] Electroless deposition and some properties of Ni-Cu-P and Ni-Sn-P coatings
    Georgieva, J.
    Armyanov, S.
    JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 2007, 11 (07) : 869 - 876
  • [4] The deposition and crystallization behaviors of electroless Ni-Cu-P deposits
    Chen, CJ
    Lin, KL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (01) : 137 - 140
  • [5] Electroless deposition of Ni-Cu-P alloys in acidic solutions
    Armyanov, S
    Georgieva, J
    Tachev, D
    Valova, E
    Nyagolova, N
    Mehta, S
    Leibman, D
    Ruffini, A
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 1999, 2 (07) : 323 - 325
  • [6] Enhancement in the deposition behavior and deposit properties of electroless Ni-Cu-P
    Hsu, JC
    Lin, KL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003, 150 (09) : C653 - C656
  • [7] Multifractal of the deposition process of amorphous electroless Ni-Cu-P alloy
    Yu, Hui-Sheng
    Sun, Xia
    Luo, Shou-Fu
    Wang, Yong-Rui
    Wu, Zi-Qin
    Wuli Xuebao/Acta Physica Sinica, 2002, 51 (05):
  • [8] Electroless deposition of Ni-Cu-P, Ni-W-P and Ni-W-Cu-P alloys
    Balaraju, JN
    Rajam, KS
    SURFACE & COATINGS TECHNOLOGY, 2005, 195 (2-3): : 154 - 161
  • [9] Multifractal of the deposition process of amorphous electroless Ni-Cu-P alloy
    Yu, HS
    Sun, X
    Luo, SF
    Wang, YR
    Wu, ZQ
    ACTA PHYSICA SINICA, 2002, 51 (05) : 999 - 1003
  • [10] The effect of Cu content on the properties and electrochemical behavior of electroless Ni-Cu-P coatings
    Zou, Y., 2013, Journal of Functional Materials, P.O. Box 1512, Chongqing, 630700, China (44):