Silicon columnar microstructures induced by an SF6/O2 plasma

被引：76

作者：

Dussart, R ^{[1
]}

Mellhaoui, X ^{[1
]}

Tillocher, T ^{[1
]}

Lefaucheux, P ^{[1
]}

Volatier, M ^{[1
]}

Socquet-Clerc, C ^{[1
]}

Brault, P ^{[1
]}

Ranson, P ^{[1
]}

机构：

[1] Univ Orleans, GREMI, F-45067 Orleans, France

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2005年 / 38卷 / 18期

关键词：

D O I：

10.1088/0022-3727/38/18/012

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An inductively coupled SF6/O-2 plasma is used to form a columnar microstructure (CMS) on silicon samples cooled at very low temperature (similar to -100 degrees C). The formation of this CMS is studied as a function of bias voltage, temperature, RF power and gas pressure. The characteristic mean diameter and mean height of the microstructure are evaluated by image processing tools from SEM micrographs. A crystallographic effect is also observed at very low temperature, which induces a needle-shaped structure. A physical mechanism is proposed to explain the formation of this CMS.

引用

页码：3395 / 3402

页数：8

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