Experimental measurements of Xe and Kr releases from UO2 and determination of their migration mechanisms - Release rate data

We present the raw data obtained from release rate at 1300 degrees C of Xe and Kr implanted in UO2, related to [1]. We performed different sample preparation (polishing treatment) on polycrystalline and monocrystalline UO2. Ion implantation were performed at various fluences between 9.5 x 10(10) to 5 x 10(14) i/cm(2) in UO2 samples. Release rate of Xe and Kr are obtained at 1300 degrees C under vacuum from desorption experiments performed on the PIAGARA plateform at the CENBG (Centre d'Etudes Nucleaires de Bordeaux-Gradignan). Since we made a variety of samples depending on multiple parameters (sample type, sample preparation, ion implantation type and fluence), these data represent a serious amount of work that could be saved for the scientific community that might use them for other purposes such as burst modelling. (C) 2021 Published by Elsevier Inc.