Addition of Hydrocarbons to H-Si(100) in Extra-Mild Conditions: A Novel Mechanism Valid for Single and Multiple C-C Bonds

被引:5
|
作者
Cossi, Maurizio [1 ]
Boccia, Alice [2 ]
Marrani, Andrea G. [2 ]
Zanoni, Robertino [2 ]
机构
[1] Univ Piemonte Orientale, Dipartimento Sci & Tecnol Avanzate DISTA, Ctr Interdisciplinare Nano SiSTeMI, I-15100 Alessandria, Italy
[2] Univ Roma La Sapienza, Dipartimento Chim, I-00185 Rome, Italy
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2011年 / 115卷 / 39期
关键词
COVALENTLY ATTACHED MONOLAYERS; SELF-DIRECTED GROWTH; H-TERMINATED SI(111); SILICON SURFACES; AB-INITIO; FUNCTIONALIZATION; SI(100); ALKENES; 1-AMINO-3-CYCLOPENTENE; ADSORPTION;
D O I
10.1021/jp204668u
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The establishment of strong C-Si bonds connecting a molecular moiety to the Si surface has been widely reported with different synthetic recipes, but general and reliable reaction mechanisms have not been described yet for the distinct chemical routes. The coupling of a suitable functional group in the molecule with a reactive termination of the Si surface is a prerequisite for the reaction to happen, and the presence of a C-C multiple bond has long been thought to be necessary for an extra-mild attachment, as in the visible light induced organics-Si anchoring reaction. In this paper, the addition of saturated and unsaturated hydrocarbons to the hydrogenated Si(100) surface has been modeled by density functional theory calculations. The aim is to describe a mechanism allowing for the addition of single C-C bonds to Si(100) and the addition of C=C bonds with preservation of the unsaturation. In fact, both these reactions have been observed recently, but they are not explained by radical-initiated hydrosilylation, the more commonly invoked mechanism for this class of processes. The mechanism proposed here is described by computing the reaction path in the ground state and recomputing the energies in the first excited state. Both for saturated hydrocarbons and for unsaturated hydrocarbons we found that the activation barriers in the excited state reduce to about 60-65% of their ground state value. The barrier lowering is explained in terms of the frontier orbital change along the reaction path. These findings can explain why visible light can activate the formation of a C-Si bond, even if it is not energetic enough to break a H-Si bond.
引用
收藏
页码:19210 / 19215
页数:6
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