Bragg Grating Optical Filters by UV Nanoimprinting

被引：3
|
作者：
Casalboni, M. [1 ,2 ]
Dominici, L. [3 ,4 ]
Foglietti, V. [5 ]
Michelotti, F. [3 ,4 ]
Orsini, E. [1 ,2 ]
Palazzesi, C. [1 ,2 ]
Stella, F. [1 ,2 ]
Prosposito, P. [1 ,2 ]
机构：
[1] Univ Roma Tor Vergata, Dept Phys, I-00133 Rome, Italy
[2] INSTM, I-00133 Rome, Italy
[3] Univ Roma La Sapienza, Dept Energet, I-00161 Rome, Italy
[4] CNISM, I-00161 Rome, Italy
[5] CNR, IFN, Inst Photon & Nanotechnol, I-00156 Rome, Italy
来源：
JOURNAL OF NANOMATERIALS | 2012年 / 2012卷
关键词：
LITHOGRAPHY; REPLICATION; FABRICATION;
D O I：
10.1155/2012/186429
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Results on an optical waveguide filter operating in the near IR region are reported. The device consists of a hybrid sol-gel -based grating loaded waveguide, obtained through the merging of conventional photolithography and UV-nanoimprinting. Starting from submicrometric gratings, fabricated by electron beam lithography, a softmould has been produced and the original structures were replicated onto sol-gel photosensitive films. A final photolithographic step allowed the production of grating-loaded channel waveguides. The devices were optically characterized by transmission measurements in the telecom range 1450-1590 nm. The filter extinction ratio is -11 dB and the bandwidth is 1.7 nm.
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页数：5
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