Growth rate and its limiting process for metalorganic vapor phase epitaxial InN

被引:0
|
作者
Adachi, M [1 ]
Murakami, Y [1 ]
Hashimoto, A [1 ]
Yamamoto, A [1 ]
机构
[1] Fukui Univ, Fac Engn, Dept Elect & Elect Engn, Fukui 9108507, Japan
关键词
InN; MOVPE; growth rate; NH3; decomposition; limiting process;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Growth rate as a function of growth temperature has been studied for MOVPE InN. In the temperature range of 500-600 degreesC, growth rate is increased with increasing growth temperature while TMI supply is constant, and shows a saturation against the increase in TMI supply. At 650 degreesC, on the other hand, such a saturation is not seen for TMI supply up to 28 mu mol/min. As a result of this, a growth rate as high as 0.8 mum/h is obtained at 650(.)degreesC Activation energy (similar to0.76 eV) for saturated growth rate is in good agreement with that (0.79 eV) reported for the thermal decomposition of NH, showing that the growth-rate is dominated by the active nitrogen supply and its saturation is due to the deficiency of active nitrogen. At around 650 degreesC, growth rate is lower than that expected from the values at lower temperatures. This seems to be due to the decomposition of grown InN.
引用
收藏
页码:339 / 342
页数:4
相关论文
共 50 条
  • [1] Epitaxial growth of InN by plasma-assisted metalorganic chemical vapor deposition
    Sato, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (5B): : L595 - L597
  • [2] Recent studies on metalorganic vapor phase epitaxial growth of ZnTe
    Nishio, M
    Hayashida, K
    Guo, QX
    Ogawa, H
    ADVANCED PHOTONIC SENSORS: TECHNOLOGY AND APPLICATIONS, 2000, 4220 : 355 - 360
  • [3] Growth of InN and its effect on InGaN epilayer by metalorganic chemical vapor deposition
    Hartono, H.
    Chen, P.
    Chua, S. J.
    Fitzgerald, E. A.
    THIN SOLID FILMS, 2007, 515 (10) : 4408 - 4411
  • [4] Iodine vapor phase growth of GaN: dependence of epitaxial growth rate on process parameters
    Tassev, V
    Bliss, D
    Suscavage, M
    Paduano, QS
    Wang, SQ
    Bouthillette, L
    JOURNAL OF CRYSTAL GROWTH, 2002, 235 (1-4) : 140 - 148
  • [5] The influence of prestrained metalorganic vapor phase epitaxial gallium-nitride templates on hydride vapor phase epitaxial growth
    Klein, M.
    Meisch, T.
    Lipski, F.
    Scholz, F.
    APPLIED PHYSICS LETTERS, 2014, 105 (09)
  • [7] METALORGANIC VAPOR-PHASE EPITAXIAL-GROWTH OF GAINASP/GAAS
    KNAUER, A
    ERBERT, G
    GRAMLICH, S
    OSTER, A
    RICHTER, E
    ZEIMER, U
    WEYERS, M
    JOURNAL OF ELECTRONIC MATERIALS, 1995, 24 (11) : 1655 - 1658
  • [8] HETEROEPITAXIAL GROWTH OF INN BY MICROWAVE-EXCITED METALORGANIC VAPOR-PHASE EPITAXY
    WAKAHARA, A
    YOSHIDA, A
    APPLIED PHYSICS LETTERS, 1989, 54 (08) : 709 - 711
  • [9] Characterization of double-buffer layers and its application for the metalorganic vapor phase epitaxial growth of GaN
    Uchida, K
    Nishida, K
    Kondo, M
    Munekata, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (07): : 3882 - 3888
  • [10] Epitaxial growth and characterization of ZnGeN2 by metalorganic vapor phase epitaxy
    Misaki, T
    Wakahara, A
    Okada, H
    Yoshida, A
    JOURNAL OF CRYSTAL GROWTH, 2004, 260 (1-2) : 125 - 129