Effects of H2 plasma treatment on the electrical properties of titanium-doped indium oxide films prepared by polymer-assisted deposition

被引：4
|
作者：
Hwang, Joo-Sang [1 ]
Lee, Ji-Myon [1 ]
Vishwanath, Sujaya Kumar [2 ]
Kim, Jihoon [2 ]
机构：
[1] Sunchon Natl Univ, Dept Printed Elect Engn, Sunchon 540742, Chonnam, South Korea
[2] Kongju Natl Univ, Div Adv Mat Engn, Chenan Si 331717, Chungnam, South Korea
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2015年 / 33卷 / 04期
基金：
新加坡国家研究基金会;
关键词：
ORGANIC SOLAR-CELLS; OPTICAL-PROPERTIES; ZINC-OXIDE; THIN-FILMS; HYDROGEN PLASMA; TRANSPARENT; TRANSISTORS; ELECTRODES; DEVICES; ITO;
D O I：
10.1116/1.4922289
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The effects of hydrogen (H-2) plasma on the optical and electrical properties of titanium-doped InO (TIO) grown on glass substrates using polymer-assisted deposition are reported. Samples were exposed to H-2 plasma formed by inductively coupled plasma (ICP). After plasma treatment at a power of 100 W, the sheet resistance of the TIO films decreased from 11 000 to 285 Omega/sq. Additionally, the Hall mobility and sheet carrier concentration of the films increased as the ICP source power was increased to 100 W, without affecting the optical transmittance of the films, due to the removal of the polymer residues and the formation of oxygen vacancies. (C) 2015 American Vacuum Society.
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页数：5
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