Design, fabrication and characterization of plasmonic gratings for SERS

被引：13
|
作者：
Romanato, F. [1 ,2 ,4 ]
Pilot, R. [3 ]
Massari, M. [1 ,2 ]
Ongarello, T. [1 ,2 ]
Pirruccio, G. [1 ]
Zilio, P. [1 ,2 ]
Ruffato, G. [1 ,2 ]
Carli, M. [1 ,2 ]
Sammito, D. [2 ,4 ]
Giorgis, V. [2 ,4 ]
Garoli, D. [1 ,2 ,4 ]
Signorini, R. [3 ]
Schiavuta, P. [5 ]
Bozio, R. [3 ]
机构：
[1] Univ Padua, Dept Phys, I-35131 Padua, Italy
[2] LaNN Lab Nanofabricat Nanodevices, I-35127 Padua, Italy
[3] Consortium INSTM, Dept Chem Sci, I-35131 Padua, Italy
[4] IOM CNR TASC Lab, Basovizza Trieste, Italy
[5] Interuniv Consortium Nanotechnol Veneto Reg, CIVEN, I-30175 Venice, Italy
来源：
MICROELECTRONIC ENGINEERING | 2011年 / 88卷 / 08期
关键词：
Electron beam lithography; Plasmonic; EOT; SERS; ENHANCED RAMAN-SCATTERING;
D O I：
10.1016/j.mee.2011.02.052
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In order to fabricate SERS-active substrates suitable for sensing applications, reproducibility and efficiency issues must be tackled. Innovative nanofabrication techniques allow the preparation of substrates reproducible and easy to model. Theoretical modelling provides a very powerful method for optimizing the design of such substrates, i.e. tailoring their geometrical parameters for optimizing the optical response. In particular in this work a 1D digital metallic grating has been theoretically investigated to identify the configuration corresponding to the localization of the near-field radiation inside the slits. This chip has been fabricated by electron beam lithography (EBL) and electrolytic growth. The Raman enhancement factor of the chip has been measured and compared with the theoretical estimation. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码：2717 / 2720
页数：4
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