Temperature-dependent photoluminescence of ZnTe films grown on Si substrates

被引:0
|
作者
Shan, CX [1 ]
Fan, XW [1 ]
Zhang, JY [1 ]
Zhang, ZZ [1 ]
Lu, YM [1 ]
Liu, YC [1 ]
Shen, DZ [1 ]
机构
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
关键词
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
ZnTe films have been prepared on Si substrates by metal-organic chemical vapour deposition (MOCVD), and the temperature-dependent photoluminescence (PL) properties were investigated. The near-band-edge (NBE) emission of the ZnTe sample at 83K shows an asymmetry line shape, which can be decomposed into two Gaussian lines labelled by FE and BE. Temperature-dependent PL intensity of the NBE peak shows two variation regions, and an expression with two dissociation channels fits well to the experimental data. The results of the temperature-dependent full width at half maximum (FWHM) and peak energy were well understood under the framework of the two-dissociation-channel model. That is, at low temperature, the emission from bound excitons governs the NBE peak, while above 157 K, the free exciton emission becomes dominant gradually. A simple model with three energy levels was employed to describe the variation in emission intensity of BE and FE with temperature.
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页码:2049 / 2052
页数:4
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