We characterize the influence of interfacial trap sites on carrier scattering and subsequent contribution to channel noise by taking 1/f noise measurements on pentacene organic field-effect transistors (OFETs). The noise dependence on drain current from OFETs with UV-ozone treated parylene gate dielectric before the deposition of the semiconductor is compared to that of otherwise identical OFETs with no air exposure during fabrication. Our studies indicate a different noise characteristic in the two samples, which is further confirmed by increasing the carrier density under illumination and comparing the noise spectrum for photogenerated charges with gate-field-induced carriers.
机构:
Penn State Univ, Ctr Thin Film Devices & Elect Mat, University Pk, PA 16802 USAPenn State Univ, Ctr Thin Film Devices & Elect Mat, University Pk, PA 16802 USA
Klauk, H
Jackson, TN
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机构:Penn State Univ, Ctr Thin Film Devices & Elect Mat, University Pk, PA 16802 USA