Advanced Metallization for ULSI Applications FOREWORD

被引：0
|
作者：
Nakatsuka, Osamu [1 ]
Maekawa, Kazuyoshi [2 ]
Saitoh, Takeyasu [3 ]
Suzuki, Keisuke [4 ]
Takeyama, Mayumi B. [5 ]
Yokogawa, Shinji [6 ]
机构：
[1] Nagoya Univ, Nagoya, Aichi, Japan
[2] Renesas Semicond Mfg Co Ltd, Hitachinaka, Ibaraki, Japan
[3] Osaka Prefecture Univ, Sakai, Osaka, Japan
[4] Kyushu Inst Technol, Kitakyushu, Fukuoka, Japan
[5] Kitami Inst Technol, Kitami, Hokkaido, Japan
[6] Univ Electrocommun, Chofu, Tokyo, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2020年 / 59卷
关键词：
D O I：
10.35848/1347-4065/ab949d
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页数：1
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