Advanced Metallization for ULSI Applications FOREWORD

被引：0

作者：

Nakatsuka, Osamu ^{[1
]}

Maekawa, Kazuyoshi ^{[2
]}

Saitoh, Takeyasu ^{[3
]}

Suzuki, Keisuke ^{[4
]}

Takeyama, Mayumi B. ^{[5
]}

Yokogawa, Shinji ^{[6
]}

机构：

[1] Nagoya Univ, Nagoya, Aichi, Japan

[2] Renesas Semicond Mfg Co Ltd, Hitachinaka, Ibaraki, Japan

[3] Osaka Prefecture Univ, Sakai, Osaka, Japan

[4] Kyushu Inst Technol, Kitakyushu, Fukuoka, Japan

[5] Kitami Inst Technol, Kitami, Hokkaido, Japan

[6] Univ Electrocommun, Chofu, Tokyo, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2020年 / 59卷

关键词：

D O I：

10.35848/1347-4065/ab949d

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页数：1

共 50 条

[1] Foreword: Advanced metallization for ULSI applications
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[2] Advanced Metallization for ULSI Applications FOREWORD
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[9] Foreword: Advanced metallization for ULSI applications
Ueno, K., 1600, Japan Society of Applied Physics, 1-12-3 Kudan-Kita,k Chiyoda-ku, Tokyo, 102, Japan (51):
[10] Advanced Metallization for ULSI Applications
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