Interfacial reaction between Sn-3.0Ag-0.5Cu liquid solder and Ni-xZn novel UBM layers

被引:8
|
作者
Lin, Hsiu-Min [1 ]
Duh, Jenq-Gong [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu, Taiwan
来源
SURFACE & COATINGS TECHNOLOGY | 2011年 / 206卷 / 07期
关键词
Sputtering; Residual stress; Interfacial reaction; Quantitative analysis; ZN-NI; CU; RELIABILITY; STRESSES; DEPOSITS;
D O I
10.1016/j.surfcoat.2011.08.055
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This work aims to investigate the interfacial reaction under liquid reactions of Sn-3.0Ag-0.5Cu (SAC305) joints with Ni-xZn films by sputtering. The surface roughness and residual stress of the Ni-xZn film, which was regarded to an under bump metallization (UBM), were evaluated using atomic force microscope (AFM) and the curvature measurement. The X-ray diffractometry (XRD) was used to further identify microstructures. Detailed morphology of the interfacial reaction in SAC305/Ni-xZn joints was performed by a field-emission scanning electron microscope (FE-SEM) with low angle backscattered electron detector (LABE). It was demonstrated that the microstructure evolution and phase formation in the SAC305/Ni-7Zn and SAC305/Ni-20Zn joints varied from reflow time and Zn content in the UBM films. The influence of the Zn concentration in Ni-7Zn and Ni-20Zn films on the different interfacial reactions was discussed and proposed. Crown Copyright (C) 2011 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:1941 / 1946
页数:6
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