Gas sensitive behaviour and morphology of reactive evaporated V2O5 thin films

被引:0
|
作者
Wöllenstein, J
Scheulin, M
Herres, N
Becker, WJ
Böttner, H
机构
[1] Fraunhofer Inst Phys Messtech, D-79110 Freiburg, Germany
[2] Univ Kassel, D-34121 Kassel, Germany
[3] Interstaatliche Hsch Tech Buchs, Inst Mikro Syst Tech, CH-9471 Buchs SG, Switzerland
关键词
vanadium pentoxide (V2O5); thin film; gas sensor;
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The gas-sensing characteristics and the morphology of vanadium pentoxide thin films have been investigated. The thin films were prepared by reactive electron beam evaporation of vanadium on surface-oxidised silicon wafers and additional thermal oxidation. Structural and morphological analyses of the V2O5 thin films in the thickness range of 100-200nm were performed. The polycrystalline monophase V2O5 films consist of grains with surface areas in the range of 100 nm to 1 mum square. Gas measurements were carried out with single-chip thin-film sensor arrays in synthetic air with 50% humidity. The sensors are analytically suitable as they are sensitive to ammonia, methane, carbon monoxide and nitric dioxide. Particularly for NO2, a distinctive temperature dependence of the gas reaction has been observed.
引用
收藏
页码:239 / 246
页数:8
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