Simulation of carbon containing complexes at silicon-silicon grain boundaries in cluster approximation

被引:2
|
作者
Pushkarchuk, AL
Saad, AM
Fedotov, AK
Kuten, SA
机构
[1] Belarusian State Univ, Minsk 220050, BELARUS
[2] Belarusian State Univ, Inst Nucl Problems, Minsk 220050, BELARUS
[3] Al Balqa Appl Univ, Amman 11953, Jordan
关键词
polycrystalline silicone; grain boundary; carbon;
D O I
10.1016/j.tsf.2005.01.055
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The transformation of the "core" for the tilt theta 5 theta=37 [001]/(130) grain boundary (GB) in polycrystalline silicon due to incorporation of carbon atoms is studied with a method of molecular orbital-linear combinations of atomic orbital (MO LCAO) in PM3 approximation. Insertion of carbon atoms into 5- or 7-fold interstitial positions at GB "core" formed donor-like complexes which are composed of combined Si2C, Si3C or Si4C configurations depending on number x of incorporated C-atoms, Energy levels of such complexes are shifted to the bottom of the conductive band from E-c-0.536 eV to E-c-0.043 eV with increasing x front 1 to 4. (C) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:142 / 146
页数:5
相关论文
共 50 条
  • [21] Stress analysis and dislocation cluster generation in silicon crystal with artificial grain boundaries
    Tajika, Haruki
    Kutsukake, Kentaro
    Usami, Noritaka
    JOURNAL OF CRYSTAL GROWTH, 2025, 649
  • [22] Heat Transport at Silicon Grain Boundaries
    Isotta, Eleonora
    Jiang, Shizhou
    Bueno-Villoro, Ruben
    Nagahiro, Ryohei
    Maeda, Kosuke
    Mattlat, Dominique Alexander
    Odufisan, Alesanmi R.
    Zevalkink, Alexandra
    Shiomi, Junichiro
    Zhang, Siyuan
    Scheu, Christina
    Snyder, G. Jeffrey
    Balogun, Oluwaseyi
    ADVANCED FUNCTIONAL MATERIALS, 2024, 34 (40)
  • [23] GRAIN-BOUNDARIES IN POLYCRYSTALLINE SILICON
    SEAGER, CH
    ANNUAL REVIEW OF MATERIALS SCIENCE, 1985, 15 : 271 - 302
  • [24] PRECIPITATION AT GRAIN-BOUNDARIES IN SILICON
    HAMET, JF
    ABDELAOUI, R
    NOUET, G
    ALLAIS, G
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1989, 4 (1-4): : 143 - 145
  • [25] Oxide precipitation at silicon grain boundaries
    Schroer, E
    Hopfe, S
    Werner, P
    Gosele, U
    Duscher, G
    Ruhle, M
    Tan, TY
    APPLIED PHYSICS LETTERS, 1997, 70 (03) : 327 - 329
  • [26] GRAIN-BOUNDARIES IN SINTERED SILICON
    MOLLER, HJ
    AMERICAN CERAMIC SOCIETY BULLETIN, 1980, 59 (08): : 826 - 826
  • [27] PASSIVATION OF GRAIN-BOUNDARIES IN SILICON
    SEAGER, CH
    SHARP, DJ
    PANITZ, JKG
    DAIELLO, RV
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 430 - 435
  • [28] CHARGE RELAXATION IN SILICON AT GRAIN-BOUNDARIES ENRICHED IN OXYGEN AND CARBON
    ILYASHCHUK, YM
    FEDOTOV, AK
    SEMICONDUCTORS, 1995, 29 (03) : 275 - 276
  • [29] CARBON BEHAVIOR IN SINTERED SILICON-NITRIDE GRAIN-BOUNDARIES
    WATARI, K
    KAWAMOTO, M
    ISHIZAKI, K
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1989, 109 : 89 - 95
  • [30] EVIDENCE FOR GENERATION OF SILICON-SILICON, SILICON-OXYGEN, AND SILICON-CARBON DOUBLE-BONDS IN A SINGLE REACTION
    BARTON, TJ
    KILGOUR, JA
    JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1974, 96 (07) : 2278 - 2280