Concise analytical threshold voltage model for cylindrical fully depleted surrounding-gate metal-oxide-semiconductor field effect transistors

被引:9
|
作者
Chiang, TK [1 ]
机构
[1] So Taiwan Univ Technol, Dept Elect Engn, Tainan, Taiwan
关键词
quasi-2D potential analysis; effective conducting path effect; threshold voltage roll-off; SG MOSFETs; scaling factor;
D O I
10.1143/JJAP.44.2948
中图分类号
O59 [应用物理学];
学科分类号
摘要
On a basis of a quasi-2D potential analysis using the effective conducting path effect (ECPE), a concise analytical model for the threshold voltage in cylindrical fully depleted surrounding-gate (SG) metal-oxide-semiconductor field effect transistors (MOSFETs) is derived. With various depths of the effective conducting path, the minimum channel potential Phi(deff,min) in induced by ECPE is used to develop the threshold voltage model. Besides the increased depth of the effective conducting path, a thin silicon body and a decreased oxide thickness can reduce threshold voltage roll-off simultaneously. It is also observed that the threshold voltage shift depends on the scaling factor. A large scaling factor is preferred to alleviate threshold voltage degradation. This paper not only provides a simple analytical model but also offers an efficient analysis of the threshold voltage of the short-channel cylindrical fully depleted SG MOSFETs.
引用
收藏
页码:2948 / 2952
页数:5
相关论文
共 50 条
  • [1] Analytic investigation on the threshold voltage of fully-depleted surrounding-gate metal-oxide-semiconductor field-effect transistors
    Hu, Guang-Xi
    Liu, Ran
    Tang, Ting-Ao
    Wang, Ling-Li
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2008, 52 (06) : 1909 - 1912
  • [2] A generalized electrostatic scale length for fully depleted surrounding-gate metal-oxide-semiconductor field effect transistors
    Chiang, TK
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (9A): : 6452 - 6457
  • [3] New current-voltage model for surrounding-gate metal-oxide-semiconductor field effect transistors
    Chiang, TK
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (9A): : 6446 - 6451
  • [4] New current-voltage model for surrounding-gate metal-oxide-semiconductor field effect transistors
    [J]. Chiang, T.-K., 1600, Japan Society of Applied Physics (44):
  • [5] Analytical Model for Subthreshold Swing and Threshold Voltage of Surrounding Gate Metal-Oxide-Semiconductor Field-Effect Transistors
    Mei, Guanghui
    Hu, Guangxi
    Hu, Shuyan
    Gu, Jinglun
    Liu, Ran
    Tang, Tingao
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (07)
  • [6] A compact model for gate tunneling currents in undoped cylindrical surrounding-gate metal-oxide-semiconductor field-effect transistors
    Noor, Fatimah Arofiati
    Bimo, Christoforus
    Syuhada, Ibnu
    Winata, Toto
    Khairurrijal, Khairurrijal
    [J]. MICROELECTRONIC ENGINEERING, 2019, 216
  • [7] Current Model of Fully Depleted Nanoscale Surrounding-Gate Metal-Oxide-Semiconductor Field-Effect Transistors with Doped Channel in All Operation Regions
    Choi, Byung-Kil
    Jeong, Min-Kyu
    Cho, Il Hwan
    Kwon, Hyuck-In
    Lee, Jong-Ho
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (08) : 0845011 - 0845017
  • [8] Analytical Threshold Model for Nanoscale Cylindrical Surrounding-Gate Metal-Oxide-Semiconductor Field Effect Transistor with High-κ Gate Dielectric and Tri-Material Gate Stack
    Li, Cong
    Zhuang, Yi-Qi
    Han, Ru
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (12)
  • [9] A New Two-Dimensional Analytical Threshold Voltage Model for Short-Channel Triple-Material Surrounding-Gate Metal-Oxide-Semiconductor Field-Effect Transistors
    Wang, Hsin-Kai
    Wu, Sean
    Chiang, Te-Kuang
    Lee, Maw-Shung
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (05)
  • [10] Dual-Material Surrounding-Gate Metal-Oxide-Semiconductor Field Effect Transistors with Asymmetric Halo
    Li Zun-Chao
    [J]. CHINESE PHYSICS LETTERS, 2009, 26 (01)