Negative photoconductivity in In0.52Al0.48As/In0.7Ga0.3As heterostructures

被引:8
|
作者
Akazaki, Tatsushi [1 ]
Yamaguchi, Masumi [1 ]
Tsumura, Kouhei [2 ]
Nomura, Shintaro [1 ,2 ]
Takayanagi, Hideaki [3 ]
机构
[1] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
[2] Univ Tsukuba, Tsukuba, Ibaraki 3058571, Japan
[3] Tokyo Univ Sci, Tokyo 1628601, Japan
来源
关键词
negative photoconductivity; InAlAs/InGaAs heterostructure; infrared laser; deep level;
D O I
10.1016/j.physe.2007.09.004
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We investigated the transport of a two-dimensional electron gas (2DEG) in an In0.52Al0.48As/In0.7Ga0.3As heterostructure when exposed to light from infrared laser diodes (lambda = 0.78, 1.3 mu m) by means of both Shubnikov-de Haas and Hall-effect measurements. We observed negative photoconductivity due to a reduction in the number of electrons in the 2DEG when they were illuminated by photons at lambda = 1.3 mu m. We speculate that the negative photoconductivity originates from the diffusion and trapping of photo-induced hot electrons at deep impurity levels in the InAlAs barrier layer near the InAlAs/InGaAs interface. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:1341 / 1343
页数:3
相关论文
共 50 条
  • [1] Pseudomorphic In0.52Al0.48As/In0.7Ga0.3As HEMTs with an ultrahigh fT of 562 GHz
    Yamashita, Y
    Endoh, A
    Shinohara, K
    Hikosaka, K
    Matsui, T
    Hiyamizu, S
    Mimura, T
    IEEE ELECTRON DEVICE LETTERS, 2002, 23 (10) : 573 - 575
  • [2] Buried-Pt gate InP/In0.52Al0.48As/In0.7Ga0.3As pseudomorphic HEMTs
    Shin, Seung Heon
    Kim, Tae-Woo
    Song, Jong-In
    Jang, Jae-Hyung
    SOLID-STATE ELECTRONICS, 2011, 62 (01) : 106 - 109
  • [3] DC and RF characteristics of In0.52Al0.48As/In0.7Ga0.3As HEMTs at 300 and 16 K
    Endoh, A.
    Watanabe, I.
    Mimura, T.
    Matsui, T.
    ELECTRONICS LETTERS, 2013, 49 (03) : 217 - 218
  • [4] Thermally stable In0.7Ga0.3As/In0.52Al0.48As pHEMTs using thermally evaporated palladium gate metallization
    Ian, Ka Wa
    Zawawiand, Mohamad Adzhar Md
    Missous, Mohamed
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2014, 29 (03)
  • [5] 35-nm-Gate In0.7Ga0.3As/In0.52Al0.48As HEMT with 520-GHz fT
    Watanabe, Issei
    Endoh, Akira
    Mimura, Takashi
    Matsui, Toshiaki
    2007 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, CONFERENCE PROCEEDINGS, 2007, : 28 - 31
  • [6] Gate length reduction technology for pseudomorphic In0.52Al0.48As/In0.7Ga0.3As high electron mobility transistors
    Yeon, Seong-Jin
    Lee, Jongwon
    Seol, Gyungseon
    Seo, Kwangseok
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4B): : 2296 - 2299
  • [7] 120-nm gate-length In0.7Ga0.3As/In0.52Al0.48As InP-based HEMT
    Huang Jie
    Guo Tianyi
    Zhang Haiying
    Xu Jingbo
    Fu Xiaojun
    Yang Hao
    Niu Jiebin
    JOURNAL OF SEMICONDUCTORS, 2010, 31 (07)
  • [8] 120-nm gate-length In0.7Ga0.3As/In0.52Al0.48As InP-based HEMT
    黄杰
    郭天义
    张海英
    徐静波
    付晓君
    杨浩
    牛洁斌
    Journal of Semiconductors, 2010, (07) : 46 - 48
  • [9] Enhancement-mode buried-channel In0.7Ga0.3As/In0.52Al0.48As MOSFETs with high-κ gate dielectrics
    Sun, Yanning
    Kiewra, E. W.
    Koester, S. J.
    Ruiz, N.
    Callegari, A.
    Fogel, K. E.
    Sadana, D. K.
    Fompeyrine, J.
    Webb, D. J.
    Locquet, J.-P.
    Sousa, M.
    Germann, R.
    Shiu, K. T.
    Forrest, S. R.
    IEEE ELECTRON DEVICE LETTERS, 2007, 28 (06) : 473 - 475
  • [10] Low-frequency noise in pseudomorphically grown In0.52Al0.48As/In0.7Ga0.3As/InP HEMTs as a function of channel thickness
    Robin, F
    Ren, L
    Py, MA
    Buhlmann, HJ
    Beck, M
    Ilegems, M
    NOISE IN PHYSICAL SYSTEMS AND 1/F FLUCTUATIONS, PROCEEDINGS OF THE 14TH INTERNATIONAL CONFERENCE, 1997, : 35 - 38