Electronic structure of amorphous copper iodide: A p-type transparent semiconductor

被引:18
|
作者
Zhang, Zhaofu [1 ]
Guo, Yuzheng [2 ]
Robertson, John [1 ,2 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[2] Wuhan Univ, Sch Elect Engn & Automat, Wuhan 430072, Peoples R China
来源
PHYSICAL REVIEW MATERIALS | 2020年 / 4卷 / 05期
基金
英国工程与自然科学研究理事会;
关键词
OXIDE; CONDUCTION; TRANSPORT; DEFECTS; ENERGY;
D O I
10.1103/PhysRevMaterials.4.054603
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The atomic and electronic structure of the p-type transparent amorphous semiconductor CuI is calculated by ab initio molecular dynamics. It is found to consist of a random tetrahedrally bonded network. The hole effective mass is found to be quite low, as in the crystal. The valence-band maximum (VBM) state has a mixed I(p)-Cu(t(2g))-I(p) character, and its energy is relatively insensitive to disorder. An iodine excess creates holes that move the Fermi level into the valence band, but it does not pin the Fermi level above the VBM mobility edge. Thus the Fermi level can easily enter the valence band if p doped, similar to the behavior of electrons in In-Ga-Zn oxide semiconductors but opposite to that of electrons in a-Si:H. This suggests that amorphous CuI could make an effective p-type transparent semiconductor.
引用
收藏
页数:7
相关论文
共 50 条
  • [31] Room-temperature synthesized copper iodide thin film as degenerate p-type transparent conductor with a boosted figure of merit
    Yang, Chang
    Kneiss, Max
    Lorenz, Michael
    Grundmann, Marius
    PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 2016, 113 (46) : 12929 - 12933
  • [32] Investigation of electronic states in copper doped p-type silicon
    Koveshnikov, S
    Pan, Y
    Mollenkopf, H
    PROCEEDINGS OF THE FOURTH INTERNATIONAL SYMPOSIUM ON HIGH PURITY SILICON, 1996, 96 (13): : 473 - 480
  • [33] Surface electronic structure of p-type GaN(0001)
    Ryan, P
    Chao, YC
    Downes, J
    McGuinness, C
    Smith, KE
    Sampath, AV
    Moustakas, TD
    SURFACE SCIENCE, 2000, 467 (1-3) : L827 - L833
  • [34] Intrinsically p-type cuprous iodide semiconductor for hybrid light-emitting diodes
    D. Ahn
    J. D. Song
    S. S. Kang
    J. Y. Lim
    S. H. Yang
    S. Ko
    S. H. Park
    S. J. Park
    D. S. Kim
    H. J. Chang
    Joonyeon Chang
    Scientific Reports, 10
  • [35] Intrinsically p-type cuprous iodide semiconductor for hybrid light-emitting diodes
    Ahn, D.
    Song, J. D.
    Kang, S. S.
    Lim, J. Y.
    Yang, S. H.
    Ko, S.
    Park, S. H.
    Park, S. J.
    Kim, D. S.
    Chang, H. J.
    Chang, Joonyeon
    SCIENTIFIC REPORTS, 2020, 10 (01)
  • [36] Synthesis of Vacancy-Controlled Copper Iodide Semiconductor for High-Performance p-Type Thin-Film Transistors
    Lee, Hyun-Ah
    Yatsu, Kie
    Kim, Tae In
    Kwon, Hyuck-In
    Park, Ick-Joon
    ACS APPLIED MATERIALS & INTERFACES, 2022, 14 (50) : 56416 - 56426
  • [37] Amorphous TeO2 as p-type oxide semiconductor for device applications
    Robertson, John
    Zhang, Xuewei
    Gui, Qingzhong
    Guo, Yuzheng
    APPLIED PHYSICS LETTERS, 2024, 124 (21)
  • [38] Amorphous TeO2 as P-type Oxide Semiconductor for BEOL applications
    Robertson, J.
    Zhang, X.
    Gui, Q.
    Guo, Y.
    2024 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI TSA, 2024,
  • [39] Strain engineering of electronic structure, phonon, and thermoelectric properties of p-type half-Heusler semiconductor
    Khandy, Shakeel Ahmad
    Chai, Jeng-Da
    JOURNAL OF ALLOYS AND COMPOUNDS, 2021, 850 (850)
  • [40] Transparent p-type conductors.
    Shahriari, DY
    Barnabé, A
    Wahl, A
    Mason, TO
    Poeppelmeier, KR
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 221 : U711 - U712