Electrochemical silicon micromachining: A new technique

In this paper the electrochemical silicon etching in HF-based solution is demonstrated as a new technique for silicon micromachining, alternative to commonly used methods. Electrochemical etching of silicon in HF-based electrolyte, a well known technique for regular macropore formation, is here exploited to produce a multitude of different regular silicon microstructures (microtubes, microtips, microchannels, microspirals, micropillars, microwalls, etc.). The electrochemical micromachining technique is here detailed and discussed.