Electron beam projection nanopatterning using crystal lattice images obtained from high resolution transmission electron microscopy

被引：21

作者：

Lee, Hyo-Sung ^{[1
]}

Kim, Byung-Sung ^{[1
]}

Kim, Hyun-Mi ^{[1
]}

Wi, Jung-Sub ^{[1
]}

Nam, Sung-Wook ^{[1
]}

Jin, Kyung-Bae ^{[1
]}

Arai, Yoshihiro ^{[2
]}

Kim, Ki-Bum ^{[1
]}

机构：

[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea

[2] JEOL Ltd, Div Semicond Equipment, Tokyo 1968558, Japan

来源：

ADVANCED MATERIALS | 2007年 / 19卷 / 23期

关键词：

D O I：

10.1002/adma.200701119

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

An electron beam projection lithography technique that employs the various crystalline lattice images available in high-resolution transmission electron microscopy is reported. We successfully fabricated periodic arrays of various patterned structures with feature sizes of about 25 nm using single-crystalline Si and beta-Si3N4 as the mask materials.

引用

页码：4189 / +

页数：6

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