Electron beam projection nanopatterning using crystal lattice images obtained from high resolution transmission electron microscopy

被引：21
|
作者：
Lee, Hyo-Sung [1 ]
Kim, Byung-Sung [1 ]
Kim, Hyun-Mi [1 ]
Wi, Jung-Sub [1 ]
Nam, Sung-Wook [1 ]
Jin, Kyung-Bae [1 ]
Arai, Yoshihiro [2 ]
Kim, Ki-Bum [1 ]
机构：
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea
[2] JEOL Ltd, Div Semicond Equipment, Tokyo 1968558, Japan
来源：
ADVANCED MATERIALS | 2007年 / 19卷 / 23期
关键词：
D O I：
10.1002/adma.200701119
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
An electron beam projection lithography technique that employs the various crystalline lattice images available in high-resolution transmission electron microscopy is reported. We successfully fabricated periodic arrays of various patterned structures with feature sizes of about 25 nm using single-crystalline Si and beta-Si3N4 as the mask materials.
引用
收藏
页码：4189 / +
页数：6
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