InP ring-like nanostructures on In0.49Ga0.51P grown by droplet epitaxy

被引:0
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作者
Jewasuwan, Wipakorn [1 ]
Panyakeow, Somsak [1 ]
Ratanathammaphan, Somchai [1 ]
机构
[1] Chulalongkorn Univ, Dept Elect Engn, Bangkok 10330, Thailand
关键词
indium compounds; gallium compounds; semiconductor growth; nanotechnology;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have successfully to fabricate self-assembled InP ring-like nanostructures on lattice-matched In0.49Ga0.51P on GaAs substrates by solid-source molecular-beam epitaxy using droplet epitaxy technique. The growth sequence is initiated by indium deposition which was intended to form indium droplets and followed by exposure P, beam to crystallize the indium droplets to InP. Dependence of the surface morphology on the indium thickness and substrate temperature was investigated. It is observed that the ring-shape nanostructure is formed when indium thickness is 1.6 ML and the ring shape and the ring-like quantum-dot molecule is formed when the indiurn thickness is thicker than 1.6 ML. The ring-like nanostructure is formed when indium deposition at 120 degrees C and the ring shape and the ring-like quantum-dot molecule is formed when indium deposition at 150 degrees C or higher. The density, height and number of dot per molecule of ring-shape nanostructure also depended on the indium thickness and on the substrate temperature while indium deposition.
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页码:396 / +
页数:2
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