Time-resolved study of pulsed Ar-N2 and Ar-N2-H2 microwave surfaguide discharges using optical emission spectroscopy

被引:21
|
作者
Britun, Nikolay [1 ]
Godfroid, Thomas [2 ]
Snyders, Rony [1 ,2 ]
机构
[1] Univ Mons, CIRMAP, B-7000 Mons, Belgium
[2] Materia Nova Res Ctr, B-7000 Mons, Belgium
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2012年 / 21卷 / 03期
关键词
DRIVEN N-2-AR DISCHARGE; ROTATIONAL TEMPERATURE; PLASMA SOURCE; NITROGEN; FREQUENCY; ATOMS;
D O I
10.1088/0963-0252/21/3/035007
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Pulsed surfaguide microwave discharges operating at 2.45 GHz in several Ar-N-2 and Ar-N-2-H-2 gas mixtures are studied using optical emission spectroscopy. Time-resolved measurements of Ar, N-2, N-2(+), N, and H emission lines are presented. The gas temperature, and N-2 rotational and vibrational temperatures are also analyzed. Various discharge conditions, dependent on the applied power, discharge pressure, nitrogen and hydrogen content are examined. Time-resolved measurements confirm that N-2 dissociation in the discharge depends mainly on the presence of nitrogen ions (dissociative recombination). Gas temperature is found to be a power-dependent parameter, whereas vibrational temperature is mainly determined by nitrogen content and by the presence of H-2 in the mixture. Our data show that a negligible (similar to 0.2%) addition of H-2 dramatically changes the N-2 dissociation mechanism, as well as the time evolution of the emission lines during the pulse. These effects are explained by the disappearance of N-2(+) generation due to the quenching of the N-2(A) metastable level by molecular hydrogen.
引用
收藏
页数:10
相关论文
共 50 条
  • [31] Measurement of the Ar(1sy) state densities by two OES methods in Ar-N2 discharges
    Isola, L. M.
    Lopez, M.
    Cruceno, J. M.
    Gomez, B. J.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2014, 23 (01):
  • [32] THE ANISOTROPIC POTENTIALS OF HE-N2, NE-N2, AND AR-N2
    BOWERS, MS
    TANG, KT
    TOENNIES, JP
    JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (09): : 5465 - 5474
  • [33] Nonequilibrated situations of pulse modulated Ar-H2 and Ar-N2 thermal plasmas at atmospheric pressure
    Paul, KC
    Ishigaki, T
    Mostaghimi, J
    Sakuta, T
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (11) : 8867 - 8875
  • [34] CORRELATIONS BETWEEN ACTIVE SPECIES DENSITY AND IRON NITRIDE LAYER GROWTH IN AR-N2-H2 MICROWAVE POSTDISCHARGES
    MALVOS, H
    MICHEL, H
    RICARD, A
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (06) : 1328 - 1332
  • [35] 406NM AR-N2 LASER
    EDEN, JG
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1980, 25 (02): : 111 - 111
  • [36] Experimental ion mobility measurements in Ar-N2
    Santos, M. A. G.
    Cortez, A. F., V
    Perdigoto, J. M. C.
    Escada, J.
    Veenhof, R.
    Neves, P. N. B.
    Santos, F. P.
    Conde, C. A. N.
    Borges, F. I. G. M.
    JOURNAL OF INSTRUMENTATION, 2018, 13
  • [37] TABLE-TOP AR-N2 LASER
    AULT, ER
    APPLIED PHYSICS LETTERS, 1975, 26 (11) : 619 - 620
  • [38] Production of N and O atoms in flowing Ar-N2-O2 microwave discharges with separated N2 and O2 pulsed gases
    Bernardelli, E. A.
    Ricard, A.
    Belmonte, T.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (02):
  • [39] MEASUREMENT OF RATES OF CHARGE-EXCHANGE AND DISSOCIATIVE RECOMBINATION REACTIONS IN AR-N2, AR-H2 AND AR-O2 MIXTURES
    GAUCHEREL, P
    ROWE, B
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1977, 25 (02): : 211 - 227
  • [40] Optical emission diagnostics of permanent and pulsed microwave discharges in H2-CH4-N2 for diamond deposition
    Chatei, H
    Bougdira, J
    Remy, M
    Alnot, P
    SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 1233 - 1237