Physical Vapor Deposition of Copper Oxide Nanowires

被引：0
|
作者：
Comini, E. [1 ]
Faglia, G. [1 ]
Ferroni, M. [1 ]
Zappa, D. [1 ]
Sberveglieri, G. [1 ]
机构：
[1] Univ Brescia, Dept Chem & Phys, CNR IDASC SENSOR Lab, Brescia, Italy
来源：
EUROSENSORS XXIV CONFERENCE | 2010年 / 5卷
关键词：
Copper oxide; chemical sensors;
D O I：
10.1016/j.proeng.2010.09.290
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
Copper oxide nanowires have been successfully prepared by vapor phase transport technique. The deposition conditions strongly influence the morphology of the nanostructures and in turn their electrical and functional properties. Micro-structural investigation and analysis of the electrical properties were performed together with electrical and functional characterization. Transmission electron microscopy confirmed the high crystalline properties and elemental composition of copper oxide nanostructure. P-type semiconductor and sensing behaviour has been proved. (C) 2010 Published by Elsevier Ltd.
引用
收藏
页码：1051 / 1054
页数：4
相关论文
共 50 条
  • [31] Physical vapor deposition
    Physikalische Gasphasenabscheidung
    Schultrich, B., 1600, Wiley-VCH Verlag (28):
  • [32] Physical vapor deposition
    Advanced Materials and Processes, 2006, 164 (03):
  • [33] Ion solid surface interactions in ionized copper physical vapor deposition
    Liu, XY
    Daw, MS
    Kress, JD
    Hanson, DE
    Arunachalam, V
    Coronell, DG
    Liu, CL
    Voter, AF
    THIN SOLID FILMS, 2002, 422 (1-2) : 141 - 149
  • [34] Transparent conductive electrode based on LBL deposition of graphene oxide and copper nanowires
    Camic, B. Tugba
    Vapaavuori, Jaana
    Basarir, Fevzihan
    MATERIALS LETTERS, 2022, 311
  • [35] Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition
    Foster, JE
    Wendt, AE
    Wang, WW
    Booske, JH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04): : 2198 - 2203
  • [36] Reaction of copper oxide and β-diketone for in situ cleaning of metal copper in a copper chemical vapor deposition reactor
    Sekiguchi, A
    Kobayashi, A
    Koide, T
    Okada, O
    Hosokawa, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (11): : 6478 - 6486
  • [37] CHEMICAL VAPOR-DEPOSITION OF COPPER AND COPPER(I) OXIDE FROM COPPER TERT-BUTOXIDE
    JEFFRIES, PM
    GIROLAMI, GS
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 143 - INOR
  • [38] Reaction of copper oxide and β-diketone for in situ cleaning of metal copper in a copper chemical vapor deposition reactor
    Sekiguchi, Atsushi
    Kobayashi, Akiko
    Koide, Tomoaki
    Okada, Osamu
    Hosokawa, Naokichi
    1600, JJAP, Tokyo (39):
  • [39] Controlled synthesis of bismuth oxide nanowires by an oxidative metal vapor transport deposition technique
    Qiu, Yongfu
    Liu, Dongfang
    Yang, Jinhu
    Yang, Shihe
    ADVANCED MATERIALS, 2006, 18 (19) : 2604 - +
  • [40] Synthesis of metallic iridium oxide nanowires via metal organic chemical vapor deposition
    Zhang, Fengyan
    Barrowcliff, Robert
    Stecker, Greg
    Pan, Wei
    Wang, Deli
    Hsu, Sheng-Teng
    Japanese Journal of Applied Physics, Part 2: Letters, 2005, 44 (12-15):
12345