Aerosol-Assisted plasma deposition of nanocomposite thin films

被引：0

作者：

Simonnet, C. ^{[1
,2
]}

Parmar, D. ^{[3
]}

Pozsgay, V. ^{[3
]}

Feron, M. ^{[3
]}

Carnide, G. ^{[4
]}

Kahn, M. L. ^{[4
]}

Stafford, L. ^{[5
]}

Clergereaux, R. ^{[3
]}

机构：

[1] Univ Montreal, Laplace frame Int Master Sci & Technol Plasma, Montreal, PQ H3C 3J7, Canada

[2] Univ Toulouse, Laplace frame Int Master Sci & Technol Plasma, Toulouse, France

[3] Univ Toulouse, Laplace, 118 route Narbonne, F-31062 Toulouse, France

[4] LCC CNRS, 205 Route Narbonne, F-31000 Toulouse, France

[5] Univ Montreal, Dept Phys, Ave Therese Lavoie Roux, Montreal, PQ H2V 0B3, Canada

来源：

2022 IEEE 22ND INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (NANO) | 2022年

关键词：

CARBON LAYER; COATINGS; GROWTH; PECVD; SIZE;

D O I：

10.1109/NANO54668.2022.9928716

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Aerosol injection is an appealing method for plasma thin film deposition. It enables to use liquids as well as dispersions independently on their characteristics. Here, nanocomposite thin films are formed by pulsed injection of a colloidal solution in low-pressure plasma. We discuss the effects of pulsed aerosol injection parameters on the balance of matter.

引用

页码：413 / 416

页数：4

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