Post CMP cleaning using a novel HF compatible high power magasonic tank

被引：2

作者：

Tardif, F

Lardin, T

Constant, I

Fayolle, M

Boelen, P

Cowache, C

Kashkoush, I

Novak, R

机构：

[1] CEAG, DMEL, CEA Technol Avancees, LETI, F-38054 Grenoble 9, France

[2] SubMicron Syst Inc, Allentown, PA 18106 USA

来源：

SOLID STATE PHENOMENA | 1999年 / 65-6卷

关键词：

cleaning; backend; megasonics; CMP; HF;

D O I：

10.4028/www.scientific.net/SSP.65-66.169

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A novel high power megasonic tank was successfully tested for backend cleaning applications. The use of diluted HF-based chemistries coupled with megasonics enables the same low residual particle levels obtained by scrubbing to be achieved at lower cost.

引用

页码：169 / 172

页数：4

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