Activation of Ultrathin Oxide Films for Chemical Reaction by Interface Defects

被引：37
|
作者：
Jung, Jaehoon [1 ,2 ]
Shin, Hyung-Joon [1 ]
Kim, Yousoo [1 ]
Kawai, Maki [2 ]
机构：
[1] RIKEN Adv Sci Inst, Wako, Saitama 3510198, Japan
[2] Univ Tokyo, Dept Adv Mat Sci, Chiba 2778561, Japan
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2011年 / 133卷 / 16期
关键词：
NO2; ADSORPTION; THIN-FILMS; WATER; CO; DISSOCIATION; THICKNESS; CATALYSIS; OXIDATION; STATE;
D O I：
10.1021/ja200854g
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Periodic density functional theory calculations revealed strong enhancement of chemical reactivity by defects located at the oxide-metal interface for water dissociation on ultrathin MgO films deposited on Ag(100) substrate. Accumulation of charge density at the oxide-metal interface due to irregular interface defects influences the chemical reactivity of MgO films by changing the charge distribution at the oxide surface. Our results reveal the importance of buried interface defects in controlling chemical reactions on an ultrathin oxide film supported by a metal substrate.
引用
收藏
页码：6142 / 6145
页数：4
相关论文
共 50 条
  • [21] Polarity in oxide ultrathin films
    Noguera, Claudine
    Goniakowski, Jacek
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2008, 20 (26)
  • [22] Electron Transfer at Oxide Surfaces. The MgO Paradigm: from Defects to Ultrathin Films
    Pacchioni, Gianfranco
    Freund, Hajo
    CHEMICAL REVIEWS, 2013, 113 (06) : 4035 - 4072
  • [23] Structural and Chemical Transformations of Zinc Oxide Ultrathin Films on Pd(111) Surfaces
    Gao, Junxian
    Sawant, Kaustubh J.
    Miller, Jeffrey T.
    Zeng, Zhenhua
    Zemlyanov, Dmitry
    Greeley, Jeffrey P.
    ACS APPLIED MATERIALS & INTERFACES, 2021, 13 (29) : 35113 - 35123
  • [24] Enhanced reactivity at metal-oxide interface: Water interaction with MgO ultrathin films
    Savio, L
    Celasco, E
    Vattuone, L
    Rocca, M
    JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (23): : 7771 - 7778
  • [25] Interface-dependence of nucleation and self-assembly of ultrathin iron oxide films
    Ketteler, G
    Ranke, W
    SELF-ASSEMBLED NANOSTRUCTURED MATERIALS, 2003, 775 : 129 - 134
  • [26] ULTRATHIN OXIDE-NITRIDE-OXIDE FILMS
    WEINBERG, ZA
    STEIN, KJ
    NGUYEN, TN
    SUN, JY
    APPLIED PHYSICS LETTERS, 1990, 57 (12) : 1248 - 1250
  • [27] Photoconductivity of ultrathin zinc oxide films
    Takahashi, Yasutaka
    Kanamori, Masaaki
    Kondoh, Akiko
    Minoutia, Hideki
    Ohya, Yutaka
    Japanese Journal of Applied Physics, 1994, 33 (12A) : 6611 - 6615
  • [28] Chemical and electronic structure of ultrathin zirconium oxide films on silicon as determined by photoelectron spectroscopy
    Miyazaki, S
    Narasaki, M
    Ogasawara, M
    Hirose, M
    SOLID-STATE ELECTRONICS, 2002, 46 (11) : 1679 - 1685
  • [29] Effect of nitrogen containing plasmas on interface stability of hafnium oxide ultrathin films on Si(100)
    Chen, P
    Bhandari, HB
    Klein, TM
    APPLIED PHYSICS LETTERS, 2004, 85 (09) : 1574 - 1576
  • [30] INTERFACE EFFECTS IN ULTRATHIN FERROMAGNETIC-FILMS
    RENARD, JP
    BEAUVILLAIN, P
    PHYSICA SCRIPTA, 1987, T19B : 405 - 412
12345