Lattice-matched boronphosphide (BP)/hexagonal GaN heterostructure for inhibition of dislocation penetration

被引:8
|
作者
Udagawa, T [1 ]
Odawara, M [1 ]
Shimaoka, G [1 ]
机构
[1] Showa Denko R&D Ctr, Chichibu, Saitama 3691871, Japan
关键词
D O I
10.1002/pssc.200303434
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The crystallographic feature of a metal-organic CVD grown zinc-blende BP/wurtzite-GaN heterostructure was characterized utilizing high-resolution TEM and TED techniques. On the heterostructure system, the epitaxial relationship was revealed to be (0001), <a-axis>-GaN//(111), <110>-BP. (111)-BP was also found to be orientated in the "double positioning" with tracing hexagonal shape of (0001)-GaN probably because of the matching in the spacings between the a-axis of GaN (a = 0.319 nm) and the (110)-planes of BP (= 0.320 nm). (111)-BP was additionally recognized to stack in the c-direction of GaN with period of just half value of the c-axis (c = 0.518 nm). In addition to the matching property, (111)-BP joined with (0001)-GaN was found to be effective for annihilation of dislocations penetrating from the underneath GaN. (C) 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:2027 / 2030
页数:4
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