共 50 条
- [21] Laser-produced plasma light source development for extreme ultraviolet lithographyJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2004, 43 (6 B): : 3707 - 3712Komori, Hiroshi论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanSoumagne, Georg论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanAbe, Tamotsu论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanSuganuma, Takashi论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanImai, Yousuke论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanSomeya, Hiroshi论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanTakabayashi, Yuichi论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanEndo, Akira论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, JapanToyoda, Koichi论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan Hiratsuka Res. and Devmt. Center, Extreme Ultraviolet L.S.D.A., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan
- [22] Performance results of laser-produced plasma test and prototype light sources for EUV lithographyJOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2009, 8 (04):Boewering, Norbert R.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAFomenkov, Igor V.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USABrandt, David C.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USABykanov, Alexander N.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAErshov, Alex I.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAPartlo, William N.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAMyers, David W.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAFarrar, Nigel R.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAVaschenko, Georgiy O.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAKhodykin, Oleh V.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAHoffman, Jerzy R.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAChrobak, Christopher P.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USASrivastava, Shailendra N.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAAhmad, Imtiaz论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USARajyaguru, Chirag论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAGolich, Daniel论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAVidusek, David A.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USADe Dea, Silvia论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USAHou, Richard R.论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USA
- [23] Laser-produced plasma light source development for extreme ultraviolet lithographyJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (6B): : 3707 - 3712Komori, H论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanSoumagne, G论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanAbe, T论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanSuganuma, T论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanImai, Y论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanSomeya, H论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanTakabayashi, Y论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanEndo, A论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, JapanToyoda, K论文数: 0 引用数: 0 h-index: 0机构: Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan Hiratsuka Res & Dev Ctr, Extreme Ultraviolet Lithog Syst Dev Assoc, EUVA, Hiratsuka, Kanagawa 2548567, Japan
- [24] Laser Produced Plasma Light Source Development for HVMEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY V, 2014, 9048Fomenkov, Igor V.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USABrandt, David C.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAFarrar, Nigel R.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USALa Fontaine, Bruno论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAMyers, David W.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USABrown, Daniel J.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAErshov, Alex I.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USABoewering, Norbert R.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USARiggs, Daniel J.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USARafac, Robert J.论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USADe Dea, Silvia论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAPurvis, Michael论文数: 0 引用数: 0 h-index: 0机构: Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAPeeters, Rudy论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands, NL-5504 DR Veldhoven, Netherlands Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAMeiling, Hans论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands, NL-5504 DR Veldhoven, Netherlands Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAHarned, Noreen论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands, NL-5504 DR Veldhoven, Netherlands Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USASmith, Daniel论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands, NL-5504 DR Veldhoven, Netherlands Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAKazinczi, Robert论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands, NL-5504 DR Veldhoven, Netherlands Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USAPirati, Alberto论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands, NL-5504 DR Veldhoven, Netherlands Cymer LLC, 17075 Thornmint Court, San Diego, CA 92127 USA
- [25] High average power EUV light source for the next generation lithography by laser produced xenon plasmaX-RAY SOURCES AND OPTICS, 2004, 5537 : 1 - 10Nakano, M论文数: 0 引用数: 0 h-index: 0机构: EUVA, Hiratsuka Res & Dev Ctr, Hiratsuka, Kanagawa 2548567, Japan EUVA, Hiratsuka Res & Dev Ctr, Hiratsuka, Kanagawa 2548567, JapanAbe, T论文数: 0 引用数: 0 h-index: 0机构: EUVA, Hiratsuka Res & Dev Ctr, Hiratsuka, Kanagawa 2548567, Japan EUVA, Hiratsuka Res & Dev Ctr, Hiratsuka, Kanagawa 2548567, JapanEndo, A论文数: 0 引用数: 0 h-index: 0机构: EUVA, Hiratsuka Res & Dev Ctr, Hiratsuka, Kanagawa 2548567, Japan EUVA, Hiratsuka Res & Dev Ctr, Hiratsuka, Kanagawa 2548567, Japan
- [26] Development of laser produced plasma source for EUV lithographyWeixi Jiagong Jishu, 2006, 5 (1-7+12):Institute of Electrical Engineering, Chinese Acad. of Sci., Beijing 100080, China论文数: 0 引用数: 0 h-index: 0
- [27] Performance of over 100 W HVM LPP-EUV Light SourceX-RAY LASERS 2016, 2018, 202 : 341 - 349Okazaki, S.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanNakarai, H.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanAbe, T.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanNowak, K. M.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanKawasuji, Y.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanTanaka, H.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanWatanabe, Y.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanHori, T.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanKodama, T.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanShiraishi, Y.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanYanagida, T.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanSoumagrne, G.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanYamada, T.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanYamazaki, T.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanSaitou, T.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548567, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, JapanMizoguchi, H.论文数: 0 引用数: 0 h-index: 0机构: Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan Gigaphoton Inc, 400 Yokokurashinden, Oyama, Tochigi 3238558, Japan
- [28] Laser Produced Plasma Light Sources for EUV Lithography2010 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (QELS), 2010,La Fontaine, Bruno论文数: 0 引用数: 0 h-index: 0机构: Cymer Inc, San Diego, CA 92127 USA Cymer Inc, San Diego, CA 92127 USA
- [29] Laser-produced plasma light source for extreme-ultraviolet lithography applicationsJOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):Abhari, Reza S.论文数: 0 引用数: 0 h-index: 0机构: Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, Switzerland Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, SwitzerlandRollinger, Bob论文数: 0 引用数: 0 h-index: 0机构: Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, Switzerland Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, SwitzerlandGiovannini, Andrea Z.论文数: 0 引用数: 0 h-index: 0机构: Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, Switzerland Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, SwitzerlandMorris, Oran论文数: 0 引用数: 0 h-index: 0机构: Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, Switzerland Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, SwitzerlandHenderson, Ian论文数: 0 引用数: 0 h-index: 0机构: Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, Switzerland Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, SwitzerlandEllwi, Samir S.论文数: 0 引用数: 0 h-index: 0机构: Adlyte Corp, CH-6300 Zug, Switzerland Swiss Fed Inst Technol Zurich, Lab Energy Convers, CH-8092 Zurich, Switzerland
- [30] Development of visualization system of neutral particles generated from laser-produced plasma for EUV light source2005 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, 2005, : 893 - 894论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Akinaga, K论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Fukuoka 812, Japan Kyushu Univ, Fukuoka 812, Japan论文数: 引用数: h-index:机构:Okada, T论文数: 0 引用数: 0 h-index: 0机构: Kyushu Univ, Fukuoka 812, Japan Kyushu Univ, Fukuoka 812, Japan