Embedded Multi-Die Interconnect Bridge (EMIB) - A High Density, High Bandwidth Packaging Interconnect

被引:206
|
作者
Mahajan, Ravi [1 ]
Sankman, Robert [1 ]
Patel, Neha [1 ]
Kim, Dae-Woo [1 ]
Aygun, Kemal [1 ]
Qian, Zhiguo [1 ]
Mekonnen, Yidnekachew [1 ]
Salama, Islam [1 ]
Sharan, Sujit [1 ]
Iyengar, Deepti [1 ]
Mallik, Debendra [1 ]
机构
[1] Intel Corp, Assembly Test Technol Dev, Chandler, AZ 85226 USA
关键词
dense MCP; high bandwidth packaging; heterogeneous integration;
D O I
10.1109/ECTC.2016.201
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The EMIB dense MCP technology is a new packaging paradigm that provides localized high density interconnects between two or more die on an organic package substrate, opening up new opportunities for heterogeneous on-package integration. This paper provides an overview of EMIB architecture and package capabilities. First, EMIB is compared with other approaches for high density interconnects. Some of the inherent advantages of the technology, such as the ability to cost effectively implement high density interconnects without requiring TSVs, and the ability to support the integration of many large die in an area much greater than the typical reticle size limit are highlighted. Next, the overall EMIB architecture envelope is discussed along with its constituent building blocks, the package construction with the embedded bridge, die to package interconnect features. Next, the EMIB assembly process is described at a high level. Finally, high bandwidth signaling between the die is discussed and the link bandwidth envelope is quantified.
引用
收藏
页码:557 / 565
页数:9
相关论文
共 50 条
  • [31] Interconnect Technologies and Advanced Packaging for High Performance Computing
    Shi, Jing
    Sze, Theresa
    Song, Deqiang
    Huang, Dawei
    Cunningham, John E.
    CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010), 2010, 27 (01): : 819 - 824
  • [32] High density, high aspect ratio through-wafer electrical interconnect vias for MEMS packaging
    Ok, SJ
    Kim, CH
    Baldwin, DF
    IEEE TRANSACTIONS ON ADVANCED PACKAGING, 2003, 26 (03): : 302 - 309
  • [33] High-density multi-lane connectivity for optical interconnect
    Iwaya, Mitsuhiro
    IEEE CPMT SYMPOSIUM JAPAN 2015, (ICSJ 2015), 2015, : 160 - 161
  • [34] High density electroplating bonding interconnect technology: Chip packaging and high aspect ratio passive elements
    Joung, YH
    Allen, MG
    53RD ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE, 2003 PROCEEDINGS, 2003, : 640 - 646
  • [35] LTCC materials for high density multilayer interconnect
    Hsu, JY
    Ko, WS
    Lin, HC
    Huang, YT
    Lee, YJ
    Hsu, CJ
    Hung, YC
    2000 HD INTERNATIONAL CONFERENCE ON HIGH-DENSITY INTERCONNECT AND SYSTEMS PACKAGING, 2000, 4217 : 573 - 578
  • [36] NEW HIGH DENSITY RF INTERCONNECT SYSTEM
    Tutt, Christopher
    MICROWAVE JOURNAL, 2009, : 6 - +
  • [37] New high density RF interconnect system
    Tutt, Christopher
    Microwave Journal, 2009, 52 (3 SUPPL.): : 6 - 14
  • [38] High-density hybrid interconnect methodologies
    John, J
    Zimmermann, L
    De Moor, P
    Van Hoof, C
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2004, 531 (1-2): : 202 - 208
  • [39] High-density hybrid interconnect technologies
    John, J
    Zimmermann, L
    De Moor, P
    De Munck, K
    Borgers, T
    Van Hoof, C
    MICRO-OPTICS: FABRICATION, PACKAGING, AND INTEGRATION, 2004, 5454 : 1 - 8
  • [40] Glass as a Substrate for High Density Electrical Interconnect
    Cui, Xiaoyun
    Bhatt, Deepa
    Khoshnaw, Fuad
    Hutt, David A.
    Conway, Paul P.
    EPTC: 2008 10TH ELECTRONICS PACKAGING TECHNOLOGY CONFERENCE, VOLS 1-3, 2008, : 12 - 17