EFFECT OF DEPOSITION TEMPERATURE VARIATION ON THIN FILMS SYNTHESIS VIA AACVD

被引：0
|
作者：
Shujah, T. [1 ]
Butt, A. [1 ]
Ikram, M. [2 ]
Shabbir, S. [3 ]
Ali, S. [1 ,2 ]
机构：
[1] Govt Coll Univ, Dept Phys, Mat & Nanosci Res Lab MNRL, Lahore 54000, Pakistan
[2] Govt Coll Univ, Dept Phys, Solar Applicat Res Lab, Lahore 54000, Pakistan
[3] Fatima Jinnah Women Univ, The Mall 46000, Rawalpindi, Pakistan
来源：
DIGEST JOURNAL OF NANOMATERIALS AND BIOSTRUCTURES | 2016年 / 11卷 / 03期
关键词：
AACVD; Thin Film; Nanostructures; Deposition temperature; Zn2SnO4; CHEMICAL-VAPOR-DEPOSITION; GAS SENSORS; CVD; NANOSTRUCTURES; COATINGS; OXIDES;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this study, ZnO-SnO2 composite thin films were deposited onto glass substrate via aerosol assisted chemical vapor deposition (AACVD) technique at various deposition temperatures. Effect of deposition temperature on structural, morphological, compositional and optical properties of thin film were studied by using X-ray diffraction (XRD), Scanning electron microscopy (SEM), Rutherford backscattering spectroscopy (RBS) and UV-Vis Diffuse Reflectance Spectroscopy (DRS). Results showed the successful deposition of Zn2SnO4 at 450 degrees C. At 350 degrees C, only ZnO was deposited while SnO2 was observed along with Zn2SnO4 at the deposition temperature of 400 degrees C. The synthesis technique, for its simplicity and low cost, is not only industrially attractive technique but also represents a more environmentally sustainable way for the production of nano devices with controlled stoichiometry.
引用
收藏
页码：891 / 898
页数：8
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