Co-self-assembly of mesostructured silica films from solutions of tetrahydrofuran (THF) and water, silica precursor species, and structure-directing Pluronic P123 block-copolymer molecules is reported with and without conjugated polymer guest species. The solution-phase behavior of the ternary THF-water-P123 system guided the selection of nonequilibrium synthesis conditions that allowed highly ordered 2D hexagonal or lamellar mesostructured silica to be prepared. Dilute water, molecules produced in situ by silica condensation were necessary and sufficient to promote P123 self-aggregation into micelles and ultimately liquid crystal-like inorganic-organic mesophases as the THF evaporated. Solid-state two-dimensional C-13{H-1} and Si-29{H-1} NMR characterization of the product film materials revealed highly mobile block copolymer components at room temperature,and preferential interactions of poly(ethylene oxide) moieties with the silica framework at 260 K. Solution processing in THF permitted highly hydrophobic, high molecular weight, conjugated polymers to be directly coassembled within the mesostructured inorganic-organic host matrices', during their formation. The incorporated conjugated polymers exhibited semiconducting properties and enhanced environmental photo-stability that may be exploited in electronic and optoelectronic devices.
机构:
Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
Hayase, Saeko
Kanno, Yosuke
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
Kanno, Yosuke
Watanabe, Masatoshi
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Canon Inc, Nanomat R&D Ctr, Ohta Ku, Tokyo 1468501, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
Watanabe, Masatoshi
Takahashi, Masahiko
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Canon Inc, Frontier Res Ctr, Ohta Ku, Tokyo 1468501, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
Takahashi, Masahiko
Kuroda, Kazuyuki
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
Waseda Univ, Kagami Mem Res Inst Mat Sci & Technol, Shinjuku Ku, Tokyo 1690051, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
Kuroda, Kazuyuki
Miyata, Hirokatsu
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Canon Inc, Frontier Res Ctr, Ohta Ku, Tokyo 1468501, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
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UCL, Dept Phys & Astron, London WC1E 6BT, England
UCL, London Ctr Nanotechnol, London WC1E 6BT, EnglandUniv Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England
机构:
UCL, Dept Phys & Astron, London WC1E 6BT, England
UCL, London Ctr Nanotechnol, London WC1E 6BT, EnglandUniv Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England
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Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, EnglandUniv Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England
McDonnell, Shane O.
Winroth, Gustaf
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UCL, Dept Phys & Astron, London WC1E 6BT, England
UCL, London Ctr Nanotechnol, London WC1E 6BT, EnglandUniv Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England
Winroth, Gustaf
Anderson, Harry L.
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Univ Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, EnglandUniv Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England
机构:
UCL, Dept Phys & Astron, London WC1E 6BT, England
UCL, London Ctr Nanotechnol, London WC1E 6BT, EnglandUniv Oxford, Dept Chem, Chem Res Lab, Oxford OX1 3TA, England