Model of a switching oxide trap in amorphous silicon dioxide

被引:13
|
作者
Uchino, T [1 ]
Takahashi, A [1 ]
Yoko, T [1 ]
机构
[1] Kyoto Univ, Inst Chem Res, Kyoto 6110011, Japan
来源
PHYSICAL REVIEW B | 2001年 / 64卷 / 08期
关键词
D O I
10.1103/PhysRevB.64.081310
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a model of a switching oxide trap in amorphous silicon dioxide on the basis of quantum chemical calculations on clusters of atoms. We show that the positively-charged defect center proposed in previous papers [Uchino et al., Phys. Rev. B 62, 2983 (2000) Phys. Rev. Lett. 86, 5522 (2001)] can capture an electron without accompanying complex atomic rearrangements, forming a metastable hole-electron pair that can in turn emit an electron. The present model also gives a reasonable account for the cathodoluminescence and thermally stimulated luminescence emissions at 445 nm from amorphous silicon dioxide.
引用
收藏
页数:4
相关论文
共 50 条
  • [41] Memory electrical switching in hydrated amorphous vanadium dioxide
    Putrolainen, V. V.
    Boriskov, P. P.
    Velichko, A. A.
    Pergament, A. L.
    Kuldin, N. A.
    TECHNICAL PHYSICS, 2010, 55 (02) : 247 - 250
  • [42] Memory electrical switching in hydrated amorphous vanadium dioxide
    V. V. Putrolainen
    P. P. Boriskov
    A. A. Velichko
    A. L. Pergament
    N. A. Kuldin
    Technical Physics, 2010, 55 : 247 - 250
  • [43] Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon
    Gerke, Sebastian
    Becker, Hans-Werner
    Rogalla, Detlef
    Job, Reinhart
    Terheiden, Barbara
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2016, 10 (11): : 828 - 832
  • [44] A study of trap profiles in thin silicon dioxide films at dielectric breakdown using percolation model
    Uno, A
    Ishida, A
    Okada, K
    Sakura, T
    Deguchi, K
    Kamakura, Y
    Taniguchi, K
    STRUCTURE AND ELECTRONIC PROPERTIES OF ULTRATHIN DIELECTRIC FILMS ON SILICON AND RELATED STRUCTURES, 2000, 592 : 331 - 336
  • [45] Amorphous silicon dioxide nanoparticles modulate immune responses in a model of allergic contact dermatitis
    Brian C. Palmer
    Samreen Jatana
    Sarah J. Phelan-Dickinson
    Lisa A. DeLouise
    Scientific Reports, 9
  • [46] Amorphous silicon dioxide nanoparticles modulate immune responses in a model of allergic contact dermatitis
    Palmer, Brian C.
    Jatana, Samreen
    Phelan-Dickinson, Sarah J.
    DeLouise, Lisa A.
    SCIENTIFIC REPORTS, 2019, 9 (1)
  • [47] IMPACT IONIZATION, TRAP CREATION, DEGRADATION, AND BREAKDOWN IN SILICON DIOXIDE FILMS ON SILICON
    DIMARIA, DJ
    CARTIER, E
    ARNOLD, D
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (07) : 3367 - 3384
  • [48] NATURE OF THE DOMINANT DEEP TRAP IN AMORPHOUS-SILICON NITRIDE
    KRICK, DT
    LENAHAN, PM
    KANICKI, J
    PHYSICAL REVIEW B, 1988, 38 (12): : 8226 - 8229
  • [49] Evidence for trap-conversion induced instability in amorphous silicon
    Dalal, VL
    Sharma, P
    Aziz, A
    AMORPHOUS AND NANOCRYSTALLINE SILICON-BASED FILMS-2003, 2003, 762 : 33 - 38
  • [50] NATURE OF THE DOMINANT DEEP TRAP IN AMORPHOUS-SILICON NITRIDE
    KRICK, DT
    LENAHAN, PM
    KANICKI, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (08) : C362 - C362