Model of a switching oxide trap in amorphous silicon dioxide

被引:13
|
作者
Uchino, T [1 ]
Takahashi, A [1 ]
Yoko, T [1 ]
机构
[1] Kyoto Univ, Inst Chem Res, Kyoto 6110011, Japan
来源
PHYSICAL REVIEW B | 2001年 / 64卷 / 08期
关键词
D O I
10.1103/PhysRevB.64.081310
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a model of a switching oxide trap in amorphous silicon dioxide on the basis of quantum chemical calculations on clusters of atoms. We show that the positively-charged defect center proposed in previous papers [Uchino et al., Phys. Rev. B 62, 2983 (2000) Phys. Rev. Lett. 86, 5522 (2001)] can capture an electron without accompanying complex atomic rearrangements, forming a metastable hole-electron pair that can in turn emit an electron. The present model also gives a reasonable account for the cathodoluminescence and thermally stimulated luminescence emissions at 445 nm from amorphous silicon dioxide.
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页数:4
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