Photodecarbonylation and photoinitiated polymerization from a monomer and polymer based on the α-keto ester methacryloyl phenylglyoxylate

被引:0
|
作者
Omrane, Kamel
Feng, Jin-Jin
Partch, Richard E. [1 ]
Shipp, Devon A.
机构
[1] Clarkson Univ, Dept Chem & Biomol Sci, Potsdam, NY 13699 USA
关键词
RADICAL POLYMERIZATION; CONTRACTION STRESS; RESIN COMPOSITES; PYRUVIC-ACID; PHOTOCHEMISTRY; SHRINKAGE; SYSTEMS; RAFT;
D O I
10.1039/c0py00416b
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The polymerizable alpha-keto ester methacryloylethyl phenylglyoxylate (MEPG), and its homopolymer, were synthesized and tested for their photoinitiation capabilities in a crosslinking monomer resin system containing bis-phenol A-glycidyl methacrylate (BisGMA) and triethylene glycol dimethacrylate (TEGDMA). Monomer conversion kinetic data were collected using both the MEPG and poly(MEPG) as initiator and/or comonomer. Furthermore, the evolution of CO resulting from the photoinduced decarbonylation led to a significant reduction in the volume shrinkage of the resin upon photocuring with a UV light. The shrinkage of the resin was reduced by 63% when 45% of MEPG was added to the BisGMA/TEGDMA monomer mixture of the resin. However, dispersion of the CO voids was uncontrolled, resulting in large voids which are likely to be detrimental to material properties. Addition of inorganic filler (SiO(2)) to the resin mixture did not affect CO generation and produced even less shrinkage compared to systems without SiO(2) at given MEPG concentrations.
引用
收藏
页码:1307 / 1311
页数:5
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