共 50 条
- [1] Excimer laser for 157nm lithography EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 : 816 - 826
- [2] New developments in excimer laser metrology at 157 nm METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2, 2002, 4689 : 63 - 69
- [3] Processing applications with the 157-nm fluorine excimer laser EXCIMER LASERS, OPTICS, AND APPLICATIONS, 1997, 2992 : 86 - 95
- [4] CONTACT LITHOGRAPHY AT 157 NM WITH AN F2 EXCIMER LASER JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1186 - 1189
- [6] Development of pellicle for F2(157nm) Excimer Laser PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY X, 2003, 5130 : 606 - 616
- [7] Precision machining of innovative materials using 157 nm excimer laser radiation SECOND INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2002, 4426 : 449 - 452
- [9] Precision-drilling of fused silica with 157 nm Excimer laser radiation PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS II, 2003, 4977 : 555 - 562
- [10] New aspects of micromachining and microlithography using 157-nm excimer laser radiation APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (Suppl 1): : S305 - S307