Silicon self-diffusion in MgSiO3 perovskite at 25 GPa

被引:93
|
作者
Yamazaki, D
Kato, T
Yurimoto, H
Ohtani, E
Toriumi, M
机构
[1] Univ Tokyo, Fac Sci, Inst Geol, Bunkyo Ku, Tokyo 1130033, Japan
[2] Univ Tsukuba, Inst Geosci, Tsukuba, Ibaraki 3058571, Japan
[3] Tokyo Inst Technol, Dept Earth & Planetary Sci, Meguro Ku, Tokyo 1528551, Japan
[4] Tohoku Univ, Inst Mineral Petrol & Econ Geol, Aoba Ku, Sendai, Miyagi 9808578, Japan
基金
日本学术振兴会;
关键词
silicon diffusion profile; MgSiO3; perovskite; high pressure and temperature; rheology of the lower mantle;
D O I
10.1016/S0031-9201(00)00135-7
中图分类号
P3 [地球物理学]; P59 [地球化学];
学科分类号
0708 ; 070902 ;
摘要
Silicon self-diffusion coefficients in MgSiO3 perovskite were measured under lower mantle conditions. The MgSiO3 perovskite was synthesized and diffusion annealing experiments were conducted at pressure of 25 GPa and temperature of 1673-2073 K using a MA8 type high-pressure apparatus. The diffusion profiles were obtained by secondary ion mass spectrometry. The lattice and grain boundary diffusion coefficients (D-1 and D-gb) were determined to be D-1 [m(2)/s] = 2.74 x 10(-10) exg(-336 [kJ/mol]/RT) and delta D-gb [m(3)/s] = 7.12 x 10(-17) exp(-311 [kJ/mol]/RT), respectively, where delta is the width of grain boundary, R is the gas constant and T is the absolute temperature. These diffusion coefficients play a key role for understanding the rheology of the lower mantle, (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:299 / 309
页数:11
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