Extinction of large droplets in ion-beam ablation plasma produced by ion-beam evaporation

被引:0
|
作者
Shishido, H
Yanagi, H
Kawahara, H
Suzuki, T
Yunogami, T
Suematsu, H
Jiang, WH
Yatsui, K
机构
[1] Nagaoka Univ Technol, Extreme Energy Dens Res Inst, Nagaoka, Niigata 9402188, Japan
[2] Doshisha Univ, ITEC, Kamigyo Ku, Kyoto 6028580, Japan
关键词
ablation plasma; ion-beam evaporation; thin film; droplet; target-substrate distance;
D O I
10.1143/JJAP.44.698
中图分类号
O59 [应用物理学];
学科分类号
摘要
The extinction of large droplets in ablation plasma produced by intense pulsed ion-beam evaporation (IBE) has been proposed to improve the surface morphology of At thin films on Si substrates. After the ion-beam irradiation of an A1 target, a lot of spherical objects with diameters of approximately 20 to 100 mu m were observed on the A1 target surface, they are considered to be a possible origin of droplets commonly observed on Al thin films. However, the number of large droplets decreased with increasing distance between the A1 target and Si substrate. The following model was considered to explain the obtained results. When a spherical object flies in the ablation plasma, it seems that the object fragments into small pieces or is evaporated. As a result, the number of large droplets decreases with increasing flight distance.
引用
收藏
页码:698 / 700
页数:3
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