Techniques for shadow mask deposition of non-planar dielectric layers

被引：0

作者：

Blickenstaff, SB ^{[1
]}

Nelson, TR ^{[1
]}

Sarangan, AM ^{[1
]}

机构：

[1] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA

来源：

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：700 / 701

页数：2

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