Techniques for shadow mask deposition of non-planar dielectric layers

被引：0
|
作者：
Blickenstaff, SB [1 ]
Nelson, TR [1 ]
Sarangan, AM [1 ]
机构：
[1] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA
来源：
2003 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2 | 2003年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：700 / 701
页数：2
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