Electronic and bonding structures of amorphous Si-C-N thin films by x-ray absorption spectroscopy

被引:10
|
作者
Tsai, HM
Jan, JC
Chiou, JW
Pong, WF [1 ]
Tsai, MH
Chang, YK
Chen, YY
Yang, YW
Lai, LJ
Wu, JJ
Wu, CT
Chen, KH
Chen, LC
机构
[1] Tamkang Univ, Dept Phys, Tamsui 251, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[3] Acad Sinica, Inst Phys, Taipei 107, Taiwan
[4] Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[5] Acad Sinica, Inst Atom & Mol Sci, Taipei 106, Taiwan
[6] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 106, Taiwan
关键词
D O I
10.1063/1.1409275
中图分类号
O59 [应用物理学];
学科分类号
摘要
X-ray absorption near edge structure (XANES) spectra of hard amorphous a-Si-C-N thin films with various compositions were measured at the C and N K-edge using sample drain current and fluorescent modes. The C K-edge XANES spectra of a-Si-C-N contain a relatively large 1s --> pi* peak, indicating that a substantial percentage of carbon atoms in the a-Si-C-N films have sp(2) or graphite-like bonding. Both the observed sp(2) intensity and the Young's modulus decrease with an increase in the carbon content. For N K-edge XANES spectra of the a-Si-C-N films we find the emergence of a sharp peak near the threshold when the carbon content is larger than between 9% and 36%, which indicates that carbon and nitrogen atoms tend to form local graphitic carbon nitride. (C) 2001 American Institute of Physics.
引用
收藏
页码:2393 / 2395
页数:3
相关论文
共 50 条
  • [21] Electronic and bonding properties of Fe- and Ni based hydrogenated amorphous carbon thin films by X-ray absorption, valence-band photoemission and Raman spectroscopy
    Ray, S. C.
    Tsai, H. M.
    Pao, C. W.
    Chang, W. H.
    Pong, W. F.
    Chiou, J. W.
    Tsai, M. -H.
    [J]. DIAMOND AND RELATED MATERIALS, 2011, 20 (07) : 886 - 890
  • [22] Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy
    Jan, JC
    Babu, PD
    Tsai, HM
    Pao, CW
    Chiou, JW
    Ray, SC
    Kumar, KPK
    Pong, WF
    Tsai, MH
    Jong, CA
    Chin, TS
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (16) : 1 - 3
  • [23] Electronic structure of hydrogenated amorphous Si1-xNx thin films using soft X-ray emission and absorption measurements
    Boyko, Teak
    Kasap, Safa
    Johanson, Robert
    Kobayashi, S.
    Aoki, T.
    Moewes, Alexander
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2009, 206 (05): : 935 - 939
  • [24] Investigation of thickness dependence on electronic structures of iron and nickel thin films by L-edge X-ray absorption spectroscopy
    Akgul, Guvenc
    Akgul, Funda Aksoy
    Ufuktepe, Yuksel
    [J]. VACUUM, 2014, 99 : 211 - 215
  • [25] X-ray absorption spectroscopy of amorphous alloys
    Lalvani, SB
    Croft, M
    [J]. JOURNAL OF MATERIALS SCIENCE LETTERS, 1999, 18 (16) : 1281 - 1283
  • [26] Determination of bonding structure of Si, Ge, and N incorporated amorphous carbon films by near-edge x-ray absorption fine structure and ultraviolet Raman spectroscopy
    Jung, HS
    Park, HH
    Mendieta, IR
    Smith, DA
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 96 (02) : 1013 - 1018
  • [27] Structure of DC sputtered Si-C-N thin films
    Radnóczi, G
    Sáfrán, G
    Czigány, Z
    Berlind, T
    Hultman, L
    [J]. THIN SOLID FILMS, 2003, 440 (1-2) : 41 - 44
  • [28] X-ray absorption spectroscopy study of cobalt mononitride thin films
    Mukul Gupta
    Yogesh Kumar
    Akhil Tayal
    Nidhi Pandey
    Wolfgang Caliebe
    Jochen Stahn
    [J]. SN Applied Sciences, 2020, 2
  • [29] X-ray absorption spectroscopy study of cobalt mononitride thin films
    Gupta, Mukul
    Kumar, Yogesh
    Tayal, Akhil
    Pandey, Nidhi
    Caliebe, Wolfgang
    Stahn, Jochen
    [J]. SN APPLIED SCIENCES, 2020, 2 (01)
  • [30] Effect of the nitrogen flow on the properties of Si-C-N amorphous thin films produced by magnetron sputtering
    A. O. Kozak
    V. I. Ivashchenko
    O. K. Porada
    L. A. Ivashchenko
    O. K. Sinelnichenko
    S. N. Dub
    O. S. Lytvyn
    I. I. Tymofeeva
    G. N. Tolmacheva
    [J]. Journal of Superhard Materials, 2015, 37 : 300 - 309