Electronic and bonding structures of amorphous Si-C-N thin films by x-ray absorption spectroscopy

被引:10
|
作者
Tsai, HM
Jan, JC
Chiou, JW
Pong, WF [1 ]
Tsai, MH
Chang, YK
Chen, YY
Yang, YW
Lai, LJ
Wu, JJ
Wu, CT
Chen, KH
Chen, LC
机构
[1] Tamkang Univ, Dept Phys, Tamsui 251, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 804, Taiwan
[3] Acad Sinica, Inst Phys, Taipei 107, Taiwan
[4] Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[5] Acad Sinica, Inst Atom & Mol Sci, Taipei 106, Taiwan
[6] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 106, Taiwan
关键词
D O I
10.1063/1.1409275
中图分类号
O59 [应用物理学];
学科分类号
摘要
X-ray absorption near edge structure (XANES) spectra of hard amorphous a-Si-C-N thin films with various compositions were measured at the C and N K-edge using sample drain current and fluorescent modes. The C K-edge XANES spectra of a-Si-C-N contain a relatively large 1s --> pi* peak, indicating that a substantial percentage of carbon atoms in the a-Si-C-N films have sp(2) or graphite-like bonding. Both the observed sp(2) intensity and the Young's modulus decrease with an increase in the carbon content. For N K-edge XANES spectra of the a-Si-C-N films we find the emergence of a sharp peak near the threshold when the carbon content is larger than between 9% and 36%, which indicates that carbon and nitrogen atoms tend to form local graphitic carbon nitride. (C) 2001 American Institute of Physics.
引用
收藏
页码:2393 / 2395
页数:3
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